Simulation of High Energy E-beam Lithography for Nano-Patterning : A Development of E-beam Lithography Simulator(Session A8 Nano-Lithography)(2004 Asia-Pasific Workshop on Fundamentals and Application of Advanced Semiconductor Devices (AWAD 2004))
スポンサーリンク
概要
- 論文の詳細を見る
Electron beam on high energy acceleration, which travels deeply and sharply through photoresist, became to be used in e-beam lithography apparatus for nano-patterning in due to its high resolution. An advanced electron beam lithography simulation tool is currently undergoing development for nano-patterning. This paper will demonstrate such simulation efforts with experiments at 200 keV e-beam lithography processes on PMMA, ZEP520 of which photoresist parameters and characteristics will be explained with simulation results. Electron trajectory is traced to the extreme low energy level (100 eV) for resolution enhancement. For this goal, the simulator merges low energy models (Tabulated Mott, Moller Cross Section, Vriens Cross Section, Bethe equation with discrete energy loss) to the conventional high energy models (Rutherford scattering, Moller cross section, Bethe equation).
- 社団法人電子情報通信学会の論文
- 2004-06-25
著者
-
CHUN Kukjin
School of Electrical Engineering and Inter-university Semiconductor Research Center (ISRC), Seoul Na
-
Chun Kukjin
School Of Electrical Engineering Seoul National University
-
Chun Kukjin
School Of Electrical Engineering And Computer Science #038 And Inter-university Semiconductor Resear
-
Kim H
School Of Electrical Engineering Seoul National University
-
Kim Hak
School Of Electrical Engineering And Computer Science #038 And Inter-university Semiconductor Resear
-
KIM Jinkwang
School of Electrical Engineering, Seoul National University
-
HAN Chanho
School of Electrical Engineering, Seoul National University
-
Han Chanho
School Of Electrical Engineering Seoul National University
-
Kim Hak
School Of Electrical Engineering Seoul National University
-
Kim Jinkwang
School Of Electrical Engineering Seoul National University
関連論文
- A Complementary Metal Oxide Semiconductor (CMOS) Compatible Capacitive Silicon Accelerometer with Polysilicon Rib-Style Flexures
- FMRFamide-Expressing Efferent Neurons in Eighth Abdominal Ganglion Innervate Hindgut in the Silkworm, Bombyx mori(Neurobiology)
- The Novel Deflector for Multi Arrayed Microcolumn Using Microelectromechanical System (MEMS) Technology
- The Multi Arrayed Micro-scale Electron Optical System for Electron Beam Lithography using MEMS Technology
- The Multi Arrayed Micro-scale Electron Optical System for Electron Beam Lithography using MEMS Technology
- Simulation of High Energy E-beam Lithography for Nano-Patterning : A Development of E-beam Lithography Simulator(Session A8 Nano-Lithography)(2004 Asia-Pasific Workshop on Fundamentals and Application of Advanced Semiconductor Devices (AWAD 2004))
- Simulation of High Energy E-beam Lithography for Nano-Patterning : A Development of E-beam Lithography Simulator(Session A8 Nano-Lithography)(2004 Asia-Pasific Workshop on Fundamentals and Application of Advanced Semiconductor Devices (AWAD 2004))
- Simulation of High Energy E-beam Lithography for Nano-Patterning : A Development of E-beam Lithography Simulator
- Simulation of High Energy E-beam Lithography for Nano-Patterning : A Development of E-beam Lithography Simulator
- Investigation of wafer warpage resulted from deep trench isolation in multi-layered SOI (Electron devices: 第15回先端半導体デバイスの基礎と応用に関するアジア・太平洋ワークショップ(AWAD2007))
- Investigation of wafer warpage resulted from deep trench isolation in multi-layered SOI (Silicon devices and materials: 第15回先端半導体デバイスの基礎と応用に関するアジア・太平洋ワークショップ(AWAD2007))
- A Small Size Dual-band MEMS Antenna using LC Resonators(Session 8B Emerging Devices and Technologies II,AWAD2006)
- A Small Size Dual-band MEMS Antenna using LC Resonators(Session 8B Emerging Devices and Technologies II)
- RF MEMS Technology
- Fabricaton of Poly(dimethylsiloxane) Microlens for Laser-Induced Fluorescence Detection
- Potential of Thermo-Sensitive Hydrogel as an Actuator
- Monolithic VCOs with High Q MEMS Inductors for RF Applications (Devices:先端デバイスの基礎と応用に関するアジアワークショップ)
- A Morphology-independent Wafer Level Rivet Packaging with LEGO-like Assembly (先端デバイスの基礎と応用に関するアジアワークショップ(AWAD2005))
- A Morphology-independent Wafer Level Rivet Packaging with LEGO-like Assembly (先端デバイスの基礎と応用に関するアジアワークショップ(AWAD2005))
- Monolithic VCOs with High Q MEMS Inductors for RF Applications (Devices:先端デバイスの基礎と応用に関するアジアワークショップ)
- Cantilever-Type Microelectromechanical Systems Probe Card with Through-Wafer Interconnects for Fine Pitch and High-Speed Testing
- Potential of Thermo-Sensitive Hydrogel as an Actuator
- The Novel Deflector for Multi Arrayed Microcolumn Using Microelectromechanical System (MEMS) Technology