C-Au Film Formed by Co-operation Process of Methane Plasma CVD and Sputtering of Gold(Special Issue on Recent Progress in Organic Molecular Electronics)
スポンサーリンク
概要
- 論文の詳細を見る
Carbon-gold (C-Au) film was formed by cooperation process of plasma CVD and sputtering with using methane and Ar mixture gas and gold plate discharge electrode. Refractive index of 3.1 for the film was obtained at Au atom content of 5.5 atomic%. The optical transmittance was improved significantly in the visible light wavelength range compared to the C-S-Au film reported previously. Au atom distribution in the C-Au film and the electronic polarizabilities were discussed in the relation to the refractive index.
- 社団法人電子情報通信学会の論文
- 2002-06-01
著者
-
MORITA Shinzo
Department of Electrical and Electronic Engineering and Information Engineering, Nagoya University
-
Kashem Md.
Department Of Electronics Graduate School Of Engineering Nagoya University
-
Matushita M
Nagoya Univ. Nagoya Jpn
-
Matushita Masaki
Department Of Electronics Graduate School Of Engineering Nagoya University
関連論文
- 50 nm Pattern Etching of Si Wafer by Synchrotron Radiation Excited CF_4 Plasma
- Electron Spin Resonance in Thin Polymer Films Formed in a Glow Discharge
- Carbon Gold Sulfide Synthesized by Cooperation Process of Plasma Chemical Vapor Deposition (CVD) and Sputtering
- C-Si-O(B) Thin Film-A Possible X-Ray Mask Substrate Candidate
- Bubbles Formed by Plasma Polymerization of MMA in a Tail Flame of SF_6-Ar-MMA Mixture Discharge
- Electron Beam Vacuum Lithography Using a Plasma Co-Polymerized MMA-TMT Resist
- C-13-1 C-S compound thin film formed by RF plasma CVD with using CH_4, SF_6 and H_2 mixture gas
- C-13-6 Ablation of Polyimide Interface Film by the Transmitting Electron Beam
- SC-7-1 Formation and Characterization of C-Au-S Granular Molecules
- C-Au Film Formed by Co-operation Process of Methane Plasma CVD and Sputtering of Gold(Special Issue on Recent Progress in Organic Molecular Electronics)
- Q-Mass Study on C-Au-S Film Formation by Co-operation Process of Plasma CVD and Sputtering
- 670 nm Laser Light Propagation Characteristics of 10-1μmφ Polystyrene Microsphere Array ; Optics and Quantum Electronics
- PVDF Electron Emitter by Reversed Polarization Method(Evaluation Methods and Characterization of Organic Materials)(Recent Progress in Organic Molecular Electronics)
- Q-Mass Study on C-Au-S Film Formation by Co-operation Process of Plasma CVD and Sputtering
- Electron Emission from Polyvinylidenefluoride Ferroelectric Substance by Polarization Inversion
- AFM/STM Observation of C-Au-S Conductive Granular Molecule by Co-operation Process of Plasma CVD and Sputtering(Organic-neuro Systems)(Recent Progress of Organic Molecular Electronics)
- Growing Mechanism of Thin Polymer Films by the Glow Discharge-Indirect Method