IBS法におけるスパッタガス種の鉄薄膜特性に及ぼす影響

概要

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Fe films were deposited by ion beam sputtering using Ar and Kr gases. The sputtering voltage V_s was varied in the range of 900-1800 V. The magnetic properties of the films had a significant relationship with the element used as the sputtering gas. The saturation magnetization 4πM_s was 21 kG for Ar and 20 kG for Kr. The coercivity H_c took a minimum value of 5 Oe at V_s of 1200 V for Ar. The energy and the number of energetic particles, such as the sputtered atoms and the recoiled ions bombarding the substrate was calculated by Monte-Carlo simulation in the sputtering system with an amorphous Fe target. The average energy of the sputtered atoms E_<Fe> was 36-62 eV for Ar and 30-36 eV for Kr. The average energy of the recoiled ions E_R was 200-370 eV for Ar and 60-100 eV for Kr. The difference in energy between these two sputtering gases, which have the different atomic masses, was remarkable. Bombardment with the sputtered atoms and recoiled ions at high energy reduced H_c of the Fe films. The atomic mass of the sputtering gas was an important parameter in determining the properties of films deposited by ion beam sputtering.
社団法人日本磁気学会の論文
2000-04-15