2330 微小構造体製作のための傾斜マスクによる高速原子線加工線幅の微小化

概要

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A FAB (Fast Atom Beam) manufacturing is able to make a high-aspect-ratio structure. The manufacturing precision of the line-and-space does not decrease largely in the case of the FAB manufacturing, when the distance between the mask and the substrate is situated in a limited length. In the present paper, first, a new method to make a line-and-space on the substrate by use of FAB is proposed. In the method, the mask with line-and -space is put on the substrate with slope. Changing the slope of the mask, it is possible to change the line-and-space on the substrate. Next, the manufacturing process of the mask to make a nano-meter-order line-and-space on the substrate by use of FAB etching machine is proposed. Moreover, the mask is manufactured by use of FAB and its performance of manufacturing is discussed.
2002-09-20