Structural Properties of Heavily B-Doped SiGe Thin Films for High Thermoelectric Power
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概要
- 論文の詳細を見る
- Japan Institute of Metalsの論文
- 2010-05-01
著者
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MIYAZAKI Hisashi
Department of Physical Electronics, Tokyo Institute of Technology
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MATOBA Akinari
Graduate School of Natural Science & Technology, Kanazawa University
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SASAKI Kimihiro
Graduate School of Natural Science & Technology, Kanazawa University
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MORIMOTO Jun
Department of Materials Science and Engineering, National Defense Academy
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Morimoto J
Department Of Materials Science And Engineering National Defense Academy
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Matoba Akinari
Graduate School Of Natural Sci. & Technol. Kanazawa Univ.
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Matoba Akinari
Graduate School Of Natural Science And Technology Kanazawa University
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笹木 敬司
北海道大学電子科学研究所
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Sasaki K
Advanced Technology R&d Center Mitsubishi Electric Corporation
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OKAMOTO Yoichi
Department of Materials Science and Engineering, National Defense Academy
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TAKIGUCHI Hiroaki
Department of Materials Science and Engineering, National Defense Academy
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Sasaki K
Department Of Electrical And Computer Engineering Kanazawa University
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Sasaki Kimihiro
Graduate School Of Natural Sci. & Technol. Kanazawa Univ.
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Sasaki Kimihiro
Graduate School Of Natural Science And Technology Kanazawa University
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Takiguchi Hiroaki
Department Of Materials Science And Engineering National Defense Academy
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Miyazaki Hisashi
Department Of Applied Physics Osaka City University
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Morimoto Jun
Department Of Applied Physics National Defense Academy
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Sasaki Koichi
Department Of Electronics Nagoya University
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Okamoto Y
Department Of Materials Science And Engineering National Defense Academy
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Okamoto Yoichi
Department Of Applied Physics National Defense Academy
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Sasaki Koh
Institute For Materials Research Tohoku University
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