静電容量・静電気力による局在電子サイトの選択X線分析

概要

論文の詳細を見る
For selective analyses of nano structures, an x-ray analysis in which x-ray induced photoionization of electron localizing sites is probed with capacitance (C) or electrostatic force (EF) is proposed. The photoionization of nano structures with localized electrons provides a quasi-stable state with a long lifetime of > ms. The photoionization is rapidly relaxed to initial state within ˜fs at the other sites without localized electrons. Because of high sensitivity of C and EF to the quasi-stable state with long lifetime, selective analyses of nano structure can be achieved. We demonstrate this technique with samples of Cu metal and chemically deposited Si oxide film. We observe the modulation of C and EF with a parallel plate capacitor and electrostatic force microscopy. The C modulation dependent on x-ray photon energy indicated an electronic state of Cu/Cu2O interface, and the EF modulation realized stoichiometry mapping of thin SiOx film on Si wafer.
社団法人電気学会の論文
2007-09-01