A Low Pressure Inductively-Coupled High Density Plasma Source for VLSI/ULSI Processing
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概要
- 論文の詳細を見る
- 1997-12-15
著者
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CHEN Y.
Department of Chemical and Materials Engineering, National Central University
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Lin T.
Department Of Physics Chung Yuan Christian University
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Cheng C.
Department Of Engineering And System Science National Tsing Hua University
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Tsai C.
Department Of Computer Science And Engineering Tatung University
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Tsai S.
Department Of Electrical Engineering National Chi Nan University
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Tsai C.
Department Of Engineering And System Science National Tsing Hua University
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Tsai S.
Department Of Engineering And System Science National Tsing Hua University
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LEOU K.
Department of Engineering and System Science National Tsing Hua University
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CHEN Y.
Department of Applied Analysis, State University of New York
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CHENG C.
Department of Chemical Engineering Chung, Yuan University
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