High-Rate Deposition of Microcrystalline Silicon Photovoltaic Active Layers by Plasma-Enhanced Chemical Vapor Deposition at Kilo-Pascal Pressures

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概要

• 論文の詳細を見る
• 2007-03-25

著者

• OKAMOTO Hiroaki

  Department of Electrical Engineering, Faculty of Engineering Science, Osaka University

• NAKANO Shinya

  Department of Pharmacology and Toxicology, Cancer Research Institute, Tohoku Pharmaceutical Universi

• TOYAMA Toshihiko

  Department of Systems Innovation, Graduate School of Engineering Science, Osaka University

• Nakano Shinya

  Department Of Systems Innovation Graduate School Of Engineering Science Osaka University

• Sobajima Yasushi

  Department of Systems Innovation, Graduate School of Engineering Science, Osaka University, Toyonaka

• Okamoto Hiroaki

  Department Of Advanced Materials Science And Engineering Faculty Of Engineering Yamaguchi University

• Sobajima Yasushi

  Department Of Systems Innovation Graduate School Of Engineering Science Osaka University

• Toyama Toshihiko

  Department Of Systems Innovation Graduate School Of Engineering Science Osaka University

• Toyama Toshihiko

  Department Of Physical Science Graduate School Of Engineering Science

• Okamoto Hiroaki

  Department of Advanced Materials and Science, Faculty of Engineering, Yamaguchi University

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