Formation and Thermal Stability of Nickel Germanide on Germanium Substrate
スポンサーリンク
概要
- 論文の詳細を見る
- Japan Society of Applied Physicsの論文
- 2005-11-10
著者
-
Bera Lakshmi
Institute Of Microelectronics
-
ZHANG Qingchun
Silicon Nano Device Laboratory, Department of Electrical and Computer Engineering, National Universi
-
WU Nan
Silicon Nano Device Laboratory, Department of Electrical and Computer Engineering, National Universi
-
OSIPOWICZ Thomas
Department of Physics, Faculty of Science, National University of Singapore
-
ZHU Chunxiang
Silicon Nano Device Laboratory, Department of Electrical and Computer Engineering, National Universi
-
Wu Nan
Silicon Nano Device Lab Department Of Electrical And Computer Engineering National University Of Sin
-
Wu Nan
Silicon Nano Device Lab (sndl) Department Of Electrical And Computer Engineering National University
-
Zhu Chunxiang
Silicon Nano Device Lab Department Of Electrical And Computer Engineering National University Of Sin
-
Zhu Chunxiang
Silicon Nano Device Lab (sndl) Department Of Electrical And Computer Engineering National University
-
Zhang Qingchun
Silicon Nano Device Lab Department Of Electrical And Computer Engineering National University Of Sin
-
Osipowicz Thomas
Department Of Physics Faculty Of Science National University Of Singapore
関連論文
- Formation and Thermal Stability of Nickel Germanide on Germanium Substrate
- Germanium Out-Diffusion in HfO_2 and its Impact on Electrical Properties
- Si Quantum Dot TFT Nonvolatile Memory for System-On-Panel Applications
- Dependence of Chemical Composition Ratio on Electrical Properties of HfO_2-Al_2O_3 Gate Dielectric
- The Electrical and Material Properties of HfO_xN_y Dielectric on Germanium Substrate
- Study of Mobility in Strained Silicon and Germanium Ultra Thin Body MOSFETs
- Effects of Sulfur Passivation on Ge MOS Capacitors with High-k Gate Dielectric
- The Electrical and Material Properties of HfOxNy Dielectric on Germanium Substrate
- Dependence of Chemical Composition Ratio on Electrical Properties of HfO2–Al2O3 Gate Dielectric
- Formation and Thermal Stability of Nickel Germanide on Germanium Substrate