Formation and Thermal Stability of Nickel Germanide on Germanium Substrate

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概要

• 論文の詳細を見る

• The formation and thermal stability of nickel germanide on germanium substrate were examined by both electrical and physical characterization methods. Low resistivity (14 μ$\Omega$ cm) mono-nickel–germanide was formed at a low temperature of 400°C on Ge substrate. The sheet resistance of nickel germanide changed with the germanide formation temperatures and had a similar characteristic as nickel silicide. However, the thermal stability study shows that NiGe formed on Ge substrate has a poorer thermal stability than NiSi on Si substrate, which is due to the lower activation energy of agglomeration in NiGe ($2.2\pm 0.2$ eV) compared to NiSi.

• INSTITUTE OF PURE AND APPLIED PHYSICSの論文
• 2005-10-10

著者

• Bera Lakshmi

  Institute Of Microelectronics

• Wu Nan

  Silicon Nano Device Lab (sndl) Department Of Electrical And Computer Engineering National University

• Zhu Chunxiang

  Silicon Nano Device Lab (sndl) Department Of Electrical And Computer Engineering National University

• Zhang Qingchun

  Silicon Nano Device Lab Department Of Electrical And Computer Engineering National University Of Sin

• Osipowicz Thomas

  Department Of Physics Faculty Of Science National University Of Singapore

• Zhu Chunxiang

  Silicon Nano Device Laboratory, Department of Electrical and Computer Engineering, National University of Singapore, 10 Kent Ridge Crescent, Singapore 119260

• Bera Lakshmi

  Institute of Microelectronics, Singapore 117685

• Osipowicz Thomas

  Department of Physics, Faculty of Science, National University of Singapore, 10 Kent Ridge, Singapore 119260

• Wu Nan

  Silicon Nano Device Laboratory, Department of Electrical and Computer Engineering, National University of Singapore, 10 Kent Ridge Crescent, Singapore 119260

関連論文

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• The Electrical and Material Properties of HfOxNy Dielectric on Germanium Substrate
• Dependence of Chemical Composition Ratio on Electrical Properties of HfO2–Al2O3 Gate Dielectric
• Formation and Thermal Stability of Nickel Germanide on Germanium Substrate

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