Growth of 1-μm-thick Continuous β-FeSi_2 Films on Abraded p^+-Si(001) Substrates by RF-Magnetron Sputtering
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2003-09-15
著者
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Ito K
Department Of Electrical And Electronic Engineering Faculty Of Engineering Shinshu University
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Ito K
Shinshu Univ. Nagano Jpn
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Ito Kentaro
Department Of Psychiatry Tokyo Medical University
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MOMOSE Noritaka
Department of Electrical and Electronic Engineering, Faculty of Engineering, Shinshu University
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HASHIMOTO Yoshio
Department of Electrical and Electronic Engineering, Faculty of Engineering, Shinshu University
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Hashimoto Yoshio
Department Of Dermatology Asahikawa Medical College
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Ito Kentaro
Department Of Electrical And Electronic Engineering Faculty Of Engineering Shinshu University
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Hashimoto Yoshio
Department Of Electrical And Electronic Engineering Faculty Of Engineering Shinshu University
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Momose Noritaka
Department Of Electrical And Electronic Engineering Faculty Of Engineering Shinshu University
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Hashimoto Yoshio
Department Of Dairy And Meat Science Faculty Of Agriculture Hokkaido University
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Hashimoto Yoshio
Department Of Anesthesiology University Of Hirosaki School Of Medicine
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