Threshold Energy Resist Model for Critical Dimension Prediction

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概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2003-06-30

著者

• Yoo Ji-yong

  Physics Department Hanyang University

• Sohn Dong-soo

  Physics Department Hanyang University

• OH Hye-Keun

  Physics Department, Hanyang University

• AN Ilsin

  Physics Department, Hanyang University

• KWON Young-Keun

  Physics Department, Hanyang University

• PARK Jun-Taek

  Physics Department, Hanyang University

• HAN Woo-Sung

  Physics Department, Hanyang University

• Kwon Young-keun

  Physics Department Hanyang University

• An Ilsin

  Physics Department Hanyang University

• Oh Hye-keun

  Physics Department Hanyang University

• Han Woo-sung

  Physics Department Hanyang University

• Park Jun-taek

  Physics Department Hanyang University

関連論文

• Line Width Variation due to Global Topography
• Resist Pattern Collapse with Top Rounding Resist Profile
• Microstructural and Electrical Properties of Ba_xSr_1-xTiO_3 Thin Films on Various Electrodes
• Process Proximity Correction by Neural Networks
• Threshold Energy Resist Model for Critical Dimension Prediction
• Numerical Investigation of Defect Printability in Extreme Ultraviolet (EUV) Reflector : Ru/Mo/Si Multilayer System
• Characterization of 193 nm Chemically Amplified Resist during Post Exposure Bake and Post Exposure Delay
• Photoresist Exposure Parameter Extraction from Refractive Index Change during Exposure
• Numerical Investigation of Defect Printability in Extreme Ultraviolet (EUV) Reflector: Ru/Mo/Si Multilayer System
• The Extraction of Develop Parameters by Using Cross-Sectional Critical Shape Error Method
• Resist Pattern Collapse with Top Rounding Resist Profile
• Effect of Extreme Ultraviolet Light Scattering from the Rough Absorber and Buffer Side Wall

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