Microstructural and Electrical Properties of Ba_xSr_1-xTiO_3 Thin Films on Various Electrodes
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2000-04-15
著者
-
Kim O
Hanyang Univ.‐ansan Kyunggi‐do Kor
-
AN Ilsin
Physics Department, Hanyang University
-
HONG Seokmin
Physics Department, Hanyang University
-
BAK Heungjin
Physics Department, Hanyang University
-
KIM Ok
Physics Department, Hanyang University
-
An Ilsin
Physics Department Hanyang University
-
Bak Heungjin
Physics Department Hanyang University
-
Hong Seokmin
Physics Department Hanyang University
-
Kim Ok
Physics Department Hanyang University
-
Bak Heungjim
Physics Department, Hanyang University
関連論文
- Resist Pattern Collapse with Top Rounding Resist Profile
- Microstructural and Electrical Properties of Ba_xSr_1-xTiO_3 Thin Films on Various Electrodes
- Threshold Energy Resist Model for Critical Dimension Prediction
- Plasma Source Ion Implantation for Ultrashallow Junctions: Low Energy and High Dose Rate
- Photoresist Exposure Parameter Extraction from Refractive Index Change during Exposure
- The Extraction of Develop Parameters by Using Cross-Sectional Critical Shape Error Method
- Resist Pattern Collapse with Top Rounding Resist Profile
- Effect of Extreme Ultraviolet Light Scattering from the Rough Absorber and Buffer Side Wall