Process Proximity Correction by Neural Networks

スポンサーリンク

概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2003-06-30

著者

• Yoo Ji-yong

  Physics Department Hanyang University

• JEON Kyoung-Ah

  VUV Lithography Lab., Hanyang University

• YOO Ji-Yong

  VUV Lithography Lab., Hanyang University

• PARK Jun-Taek

  VUV Lithography Lab., Hanyang University

• KIM Hyeongsoo

  Hynix Semiconductor

• AN Ilsin

  VUV Lithography Lab., Hanyang University

• OH Hye-Keun

  VUV Lithography Lab., Hanyang University

• Park Jun-taek

  Physics Department Hanyang University

関連論文

• Resist Pattern Collapse with Top Rounding Resist Profile
• Process Proximity Correction by Neural Networks
• Threshold Energy Resist Model for Critical Dimension Prediction
• Resist Pattern Collapse with Top Rounding Resist Profile
• Process Proximity Correction by Neural Networks

スポンサーリンク