Moスパッタ膜の微視的形態に関する研究

概要

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The structure of Mo films prepared under different deposition conditions was examined in terms of surface morphology (SEM), effective surface area (SRF) and crystallization (XRD). In addition, the spatial distribution of excited species of Mo was measured by optical emission spectroscopy (OES). As the Ar gas pressure increased, the surface roughness of film was enhanced. In addition, the crystallization deteriorated. It was observed that the emission of Mo from plasma sharply decreased around the substrate when the pressure was relatively high. It was presumed that the distribution of the incident angle of Mo particle on the substrate became isotropic at high pressure due to collision with Ar atoms. It was concluded that the surface roughness was enhanced by the collision of sputtered Mo atom with Ar atom.
日本真空協会の論文
1992-06-20