Photoresist Ashing Process Using Carbon Tetrafluoride Gas Plasma with Ammonia Gas Addition

スポンサーリンク

概要

著者

関連論文

Electron Microscope Study of Decagonal Quasicrystals of Al_Ni_Fe_
Monitoring Reaction Products of Novolac Resists during Puddle Development
Optical Transmittance of Anodically Oxidized Aluminum Alloy
Infrared Optical Constants of Anodic Alumina Films with Micropore Arrays
Multivacancy and Its Hydrogen Decoration in Crystalline Si
Space Group Determination of Decagonal Quasicrystals of an Al_Ni_Fe_ Alloy Using Convergent-Beam Electron Diffraction
A Highly Selective Photoresist Ashing Process for Silicon Nitride Films by Addition of Trifluoromethane : Semiconductors
Photoresist Ashing Process Using Carbon Tetrafluoride Gas Plasma with Ammonia Gas Addition
High-Speed Rotating-Disk Chemical Vapor Deposition Process for In-Situ Arsenic-Doped Polycrystalline Silicon Films
Newly Developed High-Speed Rotating Disk Chemical Vapor Deposition Equipment for Poly-Si Films
New Inductively Coupled Plasma System Using Divided Antenna for Photoresist Ashing
Plasma Emission Spectrochemical Analysis of the Surface State of Particles in a Suspension System
Properties of Bi_4Ti_3O_ Thin Films Grown at Low Temperatures
Preparation and Characterization of Ferroelectric Bi_4Ti_3O_ Thin Films Grown on (100)-Oriented Silicon Wafers
Physical Properties of Bi_4Ti_3O_ Films Grown on Si(100) Wafers
Polarization Characteristics of Alumina Films Anodized at Low Temperature
Influence of the Optical Purity on the Smectic Layer Thickness and the Transition Order in Enantiomeric Mixtures of an Antiferroelectric Liquid Crystal
Effect of Microparticles on Acousto-Optic Diffraction in Water
Raman-Nath Diffraction by Microparticles in Water
First-Principles Calculations on Mg Impurity and Mg-H Complex in GaN
Oxygen Concentration in the Top Silicon Layer of Silicon-on-Insulator Materials Formed by Low-Dose Implantation of Oxygen
Effect of Fe Impurities on the Generation of Process-Induced Microdefects in Czochralski Silicon Crystals
High Speed Recording Characteristics of 3-Beam Drive : Drive Technology
High Speed Recording Characteristics of 3-Beam Drive
First Order Paraelectric-Antiferroelectric Phase Transition in a Chiral Smectic Liquid Crystal of a Fluorine Containing Phenyl Pyrimidine Derivative
Phase Diagram and Crystal Growth of NdBa_2Cu_3O_
Phase-Equilibrium Diagram in the Ternary System Y_2O_3-BaO-CuO : Electrical Properties of Condensed Matter
Preparation of Bi_4Ti_3O_/Bi_2SiO_5/Si Structures Derived by Metal Organic Decomposition Technique
Preparation and Properties of Bi_2SiO_5/Si Structures
BaTiO_3 Films for Silicom-on-Insulator Structure
Effects of Sputtered High-Energy Particles on the Structure and Photocatalytic Performance of TiO_2 Films Prepared by a DC Reactive Sputtering Method
Relationship between the Photocatalytic Characteristics and the Oxygen Partial Pressure of TiO_2 Thin Films Prepared by a DC Reactive Sputtering Method
Photocatalytic Characteristics of TiO_2 Thin Films Prepared by Dc Reactive Magnetron Sputtering with added H_2O
Microstructural Study of Electroless-Plated CoNiReP/NiMoP Double-Layered Media for Perpendicular Magnetic Recording
Evaluation of Double-Layered Magnetic Recording Medium Composed of Perpendicular and Longitudinal Anisotropy Layers
Electroless Cobalt Alloy Perpendicular Anisotropy Films Plated from a Simplified Malonate Bath
Perpendicular Magnetic Recording Performance with Ring-Type Heads for Electroless-Plated CoNiReP/NiFeP Double-Layered Media
Newly Developed High-Speed Rotating Disk Chemical Vapor Deposition Equipment for Poly-Si Films
High-Speed Rotating-Disk Chemical Vapor Deposition Process for In-Situ Arsenic-Doped Polycrystalline Silicon Films
New Inductively Coupled Plasma System Using Divided Antenna for Photoresist Ashing
Photoresist Ashing Process Using Carbon Tetrafluoride Gas Plasma with Ammonia Gas Addition
Effect of Temperature on Photoresist Critical Dimension during Puddle Development

もっと見る

スポンサーリンク