Photoresist Ashing Process Using Carbon Tetrafluoride Gas Plasma with Ammonia Gas Addition

元データ 2001-07-15 Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyo

著者

Homma Tetsuya Postgraduate Course Of Functional Control System Shibaura Institute Of Technology
SAITO Makoto Postgraduate Courses of Functional Control Systems, Shibaura Institute of Technology
ETO Hideo Corporate Manufacturing Engineering Center, Toshiba Corporation
OMIYA Kayoko Corporate Manufacturing Engineering Center, Toshiba Corporation
NAGATOMO Takao Postgraduate Courses of Functional Control Systems, Shibaura Institute of Technology
Homma T Univ. Tokyo Tokyo Jpn
Nagatomo T Postgraduate Courses Of Functional Control Systems Shibaura Institute Of Technology
Saito M Tanaka Kikinzoku Kogyo Kk Kanagawa Jpn

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