Newly Developed High-Speed Rotating Disk Chemical Vapor Deposition Equipment for Poly-Si Films

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概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2005-01-15

著者

• Homma T

  Shibaura Inst. Technol. Tokyo Jpn

• Homma Tetsuya

  鹿児島大学 医歯総研究歯科理工学

• Homma Tetsuya

  Postgraduate Course Of Functional Control System Shibaura Institute Of Technology

• NAGATOMO Takao

  Postgraduate Courses of Functional Control Systems, Shibaura Institute of Technology

• TERAI Fujio

  Postgraduate Course of Functional Control System, Shibaura Institute of Technology

• KOBAYASHI Hiroaki

  Corporate Manufacturing Engineering Center, Toshiba Corporation

• KATSUI Shuji

  Semiconductor Company, Toshiba Corporation

• SATO Yuusuke

  Corporate Research and Development Center, Toshiba Corporation

• Nagatomo T

  Postgraduate Courses Of Functional Control Systems Shibaura Institute Of Technology

• Nagatomo Takao

  Postgraduate Course Of Functional Control Systems Shibaura Institute Of Technology

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