Effect of Grain Size on Bi_4Ti_3O_<12> Thin Film Properties
スポンサーリンク
概要
- 論文の詳細を見る
- Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
- 1998-09-01
著者
-
Yamaguchi Masaki
Research Laboratory Brother Industries Ltd.
-
Nagatomo Takao
Postgraduate Course Of Functional Control Systems Shibaura Institute Of Technology
-
NAGATOMO Takao
Research Organization for Advanced Engineering, Shibaura Institute of Technology
-
Nagatomo Takao
Research Organization For Advanced Engineering Shibaura Institute Of Technology
関連論文
- A Highly Selective Photoresist Ashing Process for Silicon Nitride Films by Addition of Trifluoromethane : Semiconductors
- High-Speed Rotating-Disk Chemical Vapor Deposition Process for In-Situ Arsenic-Doped Polycrystalline Silicon Films
- Newly Developed High-Speed Rotating Disk Chemical Vapor Deposition Equipment for Poly-Si Films
- New Inductively Coupled Plasma System Using Divided Antenna for Photoresist Ashing
- Plasma Emission Spectrochemical Analysis of the Surface State of Particles in a Suspension System
- Effects of Sputtered High-Energy Particles on the Structure and Photocatalytic Performance of TiO_2 Films Prepared by a DC Reactive Sputtering Method
- Relationship between the Photocatalytic Characteristics and the Oxygen Partial Pressure of TiO_2 Thin Films Prepared by a DC Reactive Sputtering Method
- Photocatalytic Characteristics of TiO_2 Thin Films Prepared by Dc Reactive Magnetron Sputtering with added H_2O
- Effect of Grain Size on Bi_4Ti_3O_ Thin Film Properties
- An Ultrasonic Motor Using a Shear and Bending Mode of a Disk Resonator : Ultrasonic Motor
- Effects of Sputtered High-Energy Particles on the Structure and Photocatalytic Performance of TiO2 Films Prepared by a DC Reactive Sputtering Method
- Photocatalytic Characteristics of TiO2 Thin Films Prepared by Dc Reactive Magnetron Sputtering with added H2O
- Relationship between the Photocatalytic Characteristics and the Oxygen Partial Pressure of TiO2 Thin Films Prepared by a DC Reactive Sputtering Method
- High-Speed Rotating-Disk Chemical Vapor Deposition Process for In-Situ Arsenic-Doped Polycrystalline Silicon Films
- New Inductively Coupled Plasma System Using Divided Antenna for Photoresist Ashing