High-Speed Rotating-Disk Chemical Vapor Deposition Process for In-Situ Arsenic-Doped Polycrystalline Silicon Films

スポンサーリンク

概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2005-11-30

著者

• Homma T

  Shibaura Inst. Technol. Tokyo Jpn

• Homma Tetsuya

  鹿児島大学 医歯総研究歯科理工学

• Homma Tetsuya

  Postgraduate Course Of Functional Control System Shibaura Institute Of Technology

• NAGATOMO Takao

  Postgraduate Courses of Functional Control Systems, Shibaura Institute of Technology

• TERAI Fujio

  Postgraduate Course of Functional Control System, Shibaura Institute of Technology

• KOBAYASHI Hiroaki

  Corporate Manufacturing Engineering Center, Toshiba Corporation

• KATSUI Shuji

  Semiconductor Company, Toshiba Corporation

• TAMAOKI Naoki

  Corporate Research and Development Center, Toshiba Corporation

• Nagatomo T

  Postgraduate Courses Of Functional Control Systems Shibaura Institute Of Technology

• Nagatomo Takao

  Postgraduate Course Of Functional Control Systems Shibaura Institute Of Technology

関連論文

• Optical and Color Stabilities of Paint-on Resins for Shade Modification of Restorative Resins
• Monitoring Reaction Products of Novolac Resists during Puddle Development
• Thermo-Optic Switch using Fluorinated Silicon Oxide and Organic Spin-on-Glass Films
• Properties of a Thin-Film Optical Waveguide Using Fluorinated Silicon Oxide and Organic Spin-on-Glass Films
• A Highly Selective Photoresist Ashing Process for Silicon Nitride Films by Addition of Trifluoromethane : Semiconductors
• Photoresist Ashing Process Using Carbon Tetrafluoride Gas Plasma with Ammonia Gas Addition
• High-Speed Rotating-Disk Chemical Vapor Deposition Process for In-Situ Arsenic-Doped Polycrystalline Silicon Films
• Newly Developed High-Speed Rotating Disk Chemical Vapor Deposition Equipment for Poly-Si Films
• New Inductively Coupled Plasma System Using Divided Antenna for Photoresist Ashing
• Plasma Emission Spectrochemical Analysis of the Surface State of Particles in a Suspension System
• Properties of Bi_4Ti_3O_ Thin Films Grown at Low Temperatures
• Preparation and Characterization of Ferroelectric Bi_4Ti_3O_ Thin Films Grown on (100)-Oriented Silicon Wafers
• Physical Properties of Bi_4Ti_3O_ Films Grown on Si(100) Wafers
• Optical Properties of Paint-on Resins for Shade Modification of Crown and Bridge Resins : Light Transmittance Characteristics
• Mechanical Properties of Light-cured Composite Resins Cured through Filters that Simulate Enamel
• Preparation of Bi_4Ti_3O_/Bi_2SiO_5/Si Structures Derived by Metal Organic Decomposition Technique
• Preparation and Properties of Bi_2SiO_5/Si Structures
• BaTiO_3 Films for Silicom-on-Insulator Structure
• Effects of Sputtered High-Energy Particles on the Structure and Photocatalytic Performance of TiO_2 Films Prepared by a DC Reactive Sputtering Method
• Relationship between the Photocatalytic Characteristics and the Oxygen Partial Pressure of TiO_2 Thin Films Prepared by a DC Reactive Sputtering Method
• Photocatalytic Characteristics of TiO_2 Thin Films Prepared by Dc Reactive Magnetron Sputtering with added H_2O
• Effect of Grain Size on Bi_4Ti_3O_ Thin Film Properties
• Microstructural Study of Electroless-Plated CoNiReP/NiMoP Double-Layered Media for Perpendicular Magnetic Recording
• Evaluation of Double-Layered Magnetic Recording Medium Composed of Perpendicular and Longitudinal Anisotropy Layers
• Electroless Cobalt Alloy Perpendicular Anisotropy Films Plated from a Simplified Malonate Bath
• Perpendicular Magnetic Recording Performance with Ring-Type Heads for Electroless-Plated CoNiReP/NiFeP Double-Layered Media
• Newly Developed High-Speed Rotating Disk Chemical Vapor Deposition Equipment for Poly-Si Films
• Effects of Sputtered High-Energy Particles on the Structure and Photocatalytic Performance of TiO2 Films Prepared by a DC Reactive Sputtering Method
• Photocatalytic Characteristics of TiO2 Thin Films Prepared by Dc Reactive Magnetron Sputtering with added H2O
• Relationship between the Photocatalytic Characteristics and the Oxygen Partial Pressure of TiO2 Thin Films Prepared by a DC Reactive Sputtering Method
• High-Speed Rotating-Disk Chemical Vapor Deposition Process for In-Situ Arsenic-Doped Polycrystalline Silicon Films
• New Inductively Coupled Plasma System Using Divided Antenna for Photoresist Ashing
• Photoresist Ashing Process Using Carbon Tetrafluoride Gas Plasma with Ammonia Gas Addition
• Effect of Temperature on Photoresist Critical Dimension during Puddle Development

もっと見る 閉じる

スポンサーリンク