Photocatalytic Characteristics of TiO_2 Thin Films Prepared by Dc Reactive Magnetron Sputtering with added H_2O

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概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2003-08-15

著者

• NAGATOMO Takao

  Postgraduate Courses of Functional Control Systems, Shibaura Institute of Technology

• Nagatomo T

  Postgraduate Courses Of Functional Control Systems Shibaura Institute Of Technology

• Nagatomo Takao

  Postgraduate Course Of Functional Control Systems Shibaura Institute Of Technology

• NOGUCHI Daisuke

  Postgraduate Course of Functional Control Systems, Shibaura Institute of Technology

• KAWAMATA Yoshio

  Shibaura Mechatronics Corporation

• Noguchi Daisuke

  Postgraduate Course Of Functional Control Systems Shibaura Institute Of Technology

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• Photocatalytic Characteristics of TiO_2 Thin Films Prepared by Dc Reactive Magnetron Sputtering with added H_2O
• Effect of Grain Size on Bi_4Ti_3O_ Thin Film Properties
• Effects of Sputtered High-Energy Particles on the Structure and Photocatalytic Performance of TiO2 Films Prepared by a DC Reactive Sputtering Method
• Photocatalytic Characteristics of TiO2 Thin Films Prepared by Dc Reactive Magnetron Sputtering with added H2O
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