Oxygen Concentration in the Top Silicon Layer of Silicon-on-Insulator Materials Formed by Low-Dose Implantation of Oxygen
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1996-03-15
著者
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Jablonski Jaroslaw
Komatsu Electronic Metals Co. Ltd.
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SAITO Mina
Komatsu Electronic Metals Co., Ltd.
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Saito M
Tanaka Kikinzoku Kogyo Kk Kanagawa Jpn
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KATAYAMA Tatsuhiko
Komatsu Electronic Metals Co., Ltd.
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MIYAMURA Yoshiji
Komatsu Electronic Metals Co., Ltd.
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IKEGAYA Kazuyoshi
Komatsu Electronic Metals Co., Ltd.
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IMAI Masato
Komatsu Electronic Metals Co., Ltd.
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Saito Mina
Komatsu Electronic Metals Co. Ltd.
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Jablonski Jaroslaw
Komatsu Electronic Metals Co. Ltd. Hiratsuka Jpn
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Imai Masato
Komatsu Electronic Metals Co. Ltd.
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Katayama Tatsuhiko
Komatsu Electronic Metals Co. Ltd.
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Miyamura Yoshiji
Komatsu Electronic Metals Co. Ltd.
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