The Status and Future of Low-Dose SIMOX Technology
スポンサーリンク
概要
- 論文の詳細を見る
- 1995-08-21
著者
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Jablonski Jaroslaw
Komatsu Electronic Metals Co. Ltd.
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KATAYAMA Tatsuhiko
Komatsu Electronic Metals Co., Ltd.
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IMAI Masato
Komatsu Electronic Metals Co., Ltd.
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Jablonski Jaroslaw
Komatsu Electronic Metals Co. Ltd. Hiratsuka Jpn
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Imai Masato
Komatsu Electronic Metals Co. Ltd.
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Katayama Tatsuhiko
Komatsu Electronic Metals Co. Ltd.
関連論文
- Photoluminescence Due to Degenerate Electron-Hole System in Silicon-on-Insulator Wafers under Ultraviolet Light Excitation
- Oxygen Concentration in the Top Silicon Layer of Silicon-on-Insulator Materials Formed by Low-Dose Implantation of Oxygen
- Effect of Fe Impurities on the Generation of Process-Induced Microdefects in Czochralski Silicon Crystals
- 低ドーズSIMOXウェーハの埋込酸化膜におけるITOXの効果
- The Status and Future of Low-Dose SIMOX Technology
- Photoluminescence Due to Degenerate Electron-Hole System in Silicon-on-Insulator Wafers under Ultraviolet Light Excitation
- Effect of Fe Impurities on the Generation of Process-Induced Microdefects in Czochralski Silicon Crystals