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Semiconductor Leading Edge Technol. Inc. Ibaraki Jpn | 論文
- Epitaxial Growth of BaTiO_3 Thin Film on SrTiO_3 Substrate in Ultra High Vacuum without Introducing Oxidant : Surfaces, Interfaces, and Films
- Flattening Phenomenon Observed during Epitaxial Growth of BaTiO_3 by Alternating Deposition Method
- Reciprocation Characteristics of a Magnet Levitated above a YBa_2Cu_3O_x Superconductor
- Damping Characteristics of a Magnet Oscillating above a YBCO Superconductor
- Application of Domain Transfer to Magneto-optical Recording: Domain Stabilization during Readout
- Second Harmonic Generation from Si_Ge_x Epitaxial Films with a Vicinal Face:Film Thickness Dependence
- Optical Second Harmonic Generation in Si_Ge_x Film Epitaxially Grown on Si(100)
- Relationship between Chemical Gradient and Line Edge Roughness of Chemically Amplified Extreme Ultraviolet Resist
- Assessment and extendibility of chemically amplified resists for extreme ultraviolet lithography: consideration of nanolithography beyond 22nm half-pitch
- Reconstruction of Latent Images from Dose-Pitch Matrices of Line Width and Edge Roughness of Chemically Amplified Resist for Extreme Ultraviolet Lithography
- Development of New Positive-Tone Molecular Resists Based on Fullerene Derivatives for Extreme Ultraviolet Lithography
- Resist Parameter Extraction from Line-and-Space Patterns of Chemically Amplified Resist for Extreme Ultraviolet Lithography
- Multicomponent negative-type photoresist based on Noria analog with 12 ethoxy groups
- Hard Mask Process Using Chemically Amplified 157-nm Resists
- Suppression of Metamorphoses of Metal/High-$k$ Gate Stack by Low-Temperature, Cl-Free SiN Offset Spacer, and Its Impact on Scaled Metal–Oxide–Semiconductor Field-Effect Transistors
- Analysis of Dose-Pitch Matrices of Line Width and Edge Roughness of Chemically Amplified Fullerene Resist
- Evaluation of Chemical Gradient Enhancement Methods for Chemically Amplified Extreme Ultraviolet Resists
- Analysis of Dose-Pitch Matrices of Line Width and Edge Roughness of Chemically Amplified Fullerene Resist
- In-situ Contamination Thickness Measurement by Novel Resist Evaluation System at NewSUBARU
- Extreme Ultraviolet Resist Fabricated Using Water Wheel-Like Cyclic Oligomer with Pendant Adamantyl Ester Groups