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Semiconductor Division Electronics And Telecommunications Research Institute | 論文
- Low Dielectric Constant Fluorinated Oxide Films Prepared by Remote Plasma Chemical Vapor Deposition
- Low Noise Characteristics of 0.2μm Al_Ga_As/In_Ga_As/GaAs Pseudomorphic HEMTs with Wide Head T-Shaped Multifinger Gate
- A Novel T-Shaped Shallow Trench Isolation Technology
- Characteristics of SiOF Films Formed by Remote Plasma Enhanced Chemical Vapor Deposition with SF_6 Gas
- Characterization and Removal of Trace Heavy Metal Contamination on Si-Surface Resulted from CHF_3/C_2F_6 Reactive Ion Etching
- A Comparative Study on Multiple Registration Schemes in Cellular Mobile Radio Systems Considering Mobile Power Status
- On-line Batch Process Monitoring Using Different Unfolding Method and Independent Component Analysis
- Statistical Process Monitoring with Multivariate Exponentially Weighted Moving Average and Independent Component Analysis
- DEGRADATION MECHANISM OF ELECTRON EMISSION CHARACTERISTICS IN SILICON FIELD EMITTERS
- A Novel LOCOS-Trench Combination Isolation Method for Maximum Chemical Mechanical Polishing(CMP) Process Window
- APPLICATIONS OF CHEMICAL-MECHANICAL-POLISHING PROCESS TO SILICON FIELD EMITTER ARRAY
- POLYCRYSTALLINE SILICON FIELD EMITTER ARRAYS WITH A GATED STRUCTURE
- A Novel T-Shaped Shallow Trench Isolation Technology
- Call Arrival History-Based Strategy : Adaptive Location Tracking in Personal Communication Networks
- Formation and Properties of Epitaxial CoSi2 Layers on p-Si0.83Ge0.17/p-Si(001) using a Si Capping Layer by Metal-Organic Chemical Vapor Deposition
- Formation of Nickel Silicide Layer on Strained-Si0.83Ge0.17/Si(001) using a Sacrificial Si Layer and its Morphological Instability