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National Cheng‐kung Univ. Tainan Twn | 論文
- An Improved In_Ga_P/GaAs Double Heterostructure-Emitter Bipolar Transistor Using Emitter Edge-Thinning Technique
- Application of Doping-Superlattice Collector Structure for GaAs Bipolar Transistor
- Trap Concentration Dependence on the Electrical Properties of Annealed Ultrathin Fluorinated Silicon Oxides
- Fourier Transform Infrared Characterization of Moisture Absorption in SiOF Film
- Effect of Fluorine Concentration on the Metal-Insulator-Semiconductor (MIS) Solar Cell Output Performance by Liquid Phase Deposition
- Near Room-Temperature Growth of SiO_2 Films for p-HgCdTe Passivation by Liquid Phase Deposition
- Effect of Drying Temperature on the Characteristics of the Lead Zirconium Titanate Powders Prepared by Sol-Gel Process
- Evaluation of Low-Temperature Processing of Lead Zirconate Titanate (53/47) Ceramics Derived from 1-Propanol-Based Sol-Gel Stock Solutions
- GaAs Metal-Oxide-Semiconductor Field Effect Transistors Fabricated with Low-Temperature Liquid-Phase-Deposited SiO_2
- A Novel Microwave Microstrip Surface Acoustic Wave Filter with Gigahertz Band Low-Loss Wide Bandwidth for Broad Spectrum Communication System
- Effects of Annealing on Tantalum Pentoxide Films in N_2 and N_2O Gas Environments : Surfaces, Interfaces, and Films
- Efficient Architectures for the Biorthogonal Wavelet Transform by Filter Bank and Lifting Scheme(VLSI Systems)
- Novel In_Al_As/In_xGa_As Metamorphic δ-HEMT's on GaAs Substrate with Various Channel Designs
- Analytic Modeling for Drain-Induced Barrier Lowering Phenomenon of the InGaP/InGaAs/GaAs Pseudomorphic Doped-Channel Field-Effect Transistor
- AlGaN/GaN Metal Oxide Semiconductor Heterostructure Field-Effect Transistor Based on a Liquid Phase Deposited Oxide : Semiconductors
- Surface Oxidation Kinetics of GaAs Oxide Growth by Liquid Phase Chemical-Enhanced Technique
- Investigation of Low-Temperature Deposition of Silicon Dioxide on Indium Phosphide by Liquid Phase Deposition
- CO_2 Laser Annealing on Fluorinated Silicon Oxide Films
- Near-Room-Temperature Selective Oxidation on GaAs Using Photoresist as a Mask
- Liquid Phase Chemical-Enhanced Oxidation for GaAs Operated Near Room Temperature