スポンサーリンク
Mitsubishi Electric Corp. Hyogo Jpn | 論文
- Optimization of Electrical Stimulus Pulse Parameter for Low-Power Operation of Retinal Prosthetic Device
- A 128×128 Pixel Complementary Metal Oxide Semiconductor Image Sensor with an Improved Pixel Architecture for Detecting Modulated Light Signals
- A CMOS Image Sensor for in vitro and in vivo Imaging of the Mouse Hippocampus
- A Pulse Modulation CMOS Image Sensor with 120dB Dynamic Range and 1nW/cm^2 Resolution for Bioimaging Applications
- A Flexible and Extendible Neural Stimulation Device with Distributed Multi-chip Architecture for Retinal Prosthesis
- Building a Simple Model of a Pulse-Frequency-Modulation Photosensor and Demonstration of a 128×128-pixel Pulse-Frequency-Modulation Image Sensor Fabricated in a Standard 0.35-μm Complementary Metal-Oxide Semiconductor Technology
- Proposal and Preliminary Experiments of Indoor Optical Wireless LAN Based on a CMOS Image Sensor with a High-Speed Readout Function Enabling a Low-Power Compact Module with Large Uplink Capacity(The IEICE Transactions on Communications, Vol.E86-B, No.5)
- Self-Pulsation of a Nd^-Doped Fluoride Fiber Laser Using Tm^-Doped Fiber as a Saturable Absorber(Joint Special Issue on Recent Progress in Optoelectronics and Communications)
- Self-Pulsation of a Nd^-Doped Fluoride Fiber Laser Using Tm^-Doped Fiber as a Saturable Absorber (IEICE Trans., Electron., Vol. E86-C, No. 5, Joint Special Issue on Recent Progress in Optoelectronics and Communications)
- Analysis and Optimization of Floating Body Cell Operation for High-Speed SOI-DRAM (Special Issue on Ultra-High-Speed IC and LSI Technology)
- Features of SOI DRAM's and their Potential for Low-Voltage and/or Giga-Bit Scale DRAM's (Special Issue on ULSI Memory Technology)
- Electron Localization due to Symmetry Breaking in Nonlinear Coupled-Quantum Systems
- ac Field-Induced Localization of an Electron in a Double-Well Quantum Structure
- C-6-3 化学量論的なTaN薄膜の(100)Si上での室温エピタキシャル成長(C-6.電子部品・材料,エレクトロニクス2)
- Ta-Zr合金による陽極酸化膜キャパシタの電気的特性に及ぼす熱処理温度と酸化膜厚低減の影響
- C-6-8 Ta-Zr合金による熱的に安定な高誘電率陽極酸化膜キャパシタの作製
- Al_3Ta陽極酸化膜キャパシタの作製とその耐熱性
- CPM2000-90 NbドープSrTiO_3薄膜の膜質に及ぼすMgO基板表面処理とポストアニールの影響
- CPM2000-83 薄いZrN/Zr2層膜を介在させたAl/ZrN/Zr/Siコンタクト系の熱的安定性
- In-plane Orientation and Coincidence Site Lattice Relation of Bi_2Sr_2CaCu_2O_x Thin Films Formed on Highly Mismatched (001) YAG Substrates