スポンサーリンク
Institute of Fluid Science, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan | 論文
- Lead-Free Barium Titanate Ceramics with Large Piezoelectric Constant Fabricated by Microwave Sintering
- Plasma-Induced Deterioration of Mechanical Characteristics of Microcantilever
- Reduction in Number of Sparks Generated in High-Density Plasma Process by Fixing the Wall Potential
- Novel Si Nanodisk Fabricated by Biotemplate and Defect-Free Neutral Beam Etching for Solar Cell Application
- Novel Particle-Reduction System in Plasma-Enhanced Chemical Vapor Deposition Process of Interlayer Dielectrics
- Prediction of Abnormal Etching Profile in High-Aspect-Ratio Via/Hole Etching Using On-Wafer Monitoring System
- Effect of Boundary Layer Thickness on the Photoluminescence Spectra of GaAs Grown by MOCVD
- Irradiation-Damages in Atmospheric Plasma Used in a Resist Ashing Process for Thin Film Transistors
- Hard-Mask-Through UV-Light-Induced Damage to Low-$k$ Film during Plasma Process for Dual Damascene
- Particle Modeling of Transport of $\alpha$-Ray Generated Ion Clusters in Air
- Two-Dimensional Si-Nanodisk Array Fabricated Using Bio-Nano-Process and Neutral Beam Etching for Realistic Quantum Effect Devices
- Control Performance of Interactions between Reactive Plasma Jet and Substrate
- Fabrication of Ceramic Composite Composed of Single Crystals and Ceramic Matrix using a Hybrid Sintering
- New Magnetic Nanodot Memory with FePt Nanodots
- Development of Hybrid Tight-Binding Quantum Chemical Molecular Dynamics Method and Its Application to Boron Implantation into Preamorphized Silicon Substrate
- Low Temperature, Beam-Orientation-Dependent, Lattice-Plane-Independent, and Damage-Free Oxidation for Three-Dimensional Structure by Neutral Beam Oxidation
- Fabrication of High-Performance Lead Zirconate Titanate Actuators Using the Microwave and Hot-Press Hybrid Sintering Processes
- Collision Models between F- ion and Ar, Kr, and Xe Atoms
- Property of Composite Ceramics Composed of Single Crystals and Ceramic Matrix Using Hybrid Sintering
- Surface Reaction Enhancement by UV irradiation during Si Etching Process with Chlorine Atom Beam