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Hyundai Electronics Ind. Co. Ltd. Kyungki‐do Kor | 論文
- Application of a New Empirical Model to the Electron Beam Lithography Process with Chemically Amplified Resists
- Environmentally stable chemically amplified positive resist containing vinyllactam terpolymers
- Environmentally stable chemically amplified positive resist containing vinyllactam terpolymers
- Optical Proximity Correction Using Diffused Aerial Image Model
- Optical Proximity Correction Using Diffused Aerial Image Model
- Optical Proximity Correction Using Diffused Aerial Image Model
- 光近接補正にたいする超薄膜レジストの近似モデル
- A Novel Alicyclic Polymers for 193nm Single Layer Resist Materials
- Synthesis and Characterization of Alicyclic Polymers with Hydrophilic Groups for 193 nm Single-Layer Resist
- Dielectric Properties of Hydrogen Silsesquioxane Films Degraded by Heat and Plasma Treatment
- Reliability of Thin Gate Oxides Irradiated under X-Ray Lithography Conditions
- Gate Oxide Reliability Concern Associated with X-Ray Lithography
- Investigation of Reliability Degradation of Ultra-Thin Gate Oxides Irradiated under Electron-Beam Lithography Conditions
- Intergrity of Gate Oxides Irradiated Under Electron-Beam Lithography Conditions
- Sub-100nm Lithographic Performance of Novel Electron Beam Resist
- Sub-100nm Lithographic Performance of Novel Electron Beam Resist
- Sub-100nm Lithographic Performance of Novel Electron Beam Resist
- Novel Organic Bottom Antireflective Coating Materials for 193nm Lithography
- Optical Lithography for Sub-100nm Technology
- Novel Approach for the Improvement of Post Exposure Delay Stability in ArF Resist Composed of Alicyclic Polymer