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Central Research Laboratory, Hitachi Ltd. | 論文
- Negative Tone Dry Development of Si-Containing Resists by Laser Ablation
- X-Ray Lithography with a Wet-Silylated and Dry-Developed Resist
- Prevention of Resist Pattern Collapse by Flood Exposure during Rinse Process
- New Dry Surface-Imaging Process for X-Ray Lithography
- Simulation of AZ-PN100 Resist Pattern Fluctuation in X-Ray Lithography, Including Synchrotron Beam Polarization
- Freeze-Drying Process to Avoid Resist Pattern Collapse
- X-ray Mask Technology utilizing an Optical Stepper : X-Ray Lithography
- Cell Projection Lithography with Scattering Contrast
- XY-Stage Driving Electron-Beam Mastering with Nanometer-Accuracy Positioning for High-Density Optical Disk
- Metallugical Analysis of Mix-Phase Y-Ba-Cu Oxides
- Measurements of Compositional Change in Semi-Insulating GaAs Single Crystals by Precise Lattice Parameter Measurements
- Characteristics of Bipolar Transistors with Various Depths of n^+ Buried Layers Formed by High-Energy Ion Implantation
- High-Performance In_Al_As/In_Ga_As High Electron Mobility Transistors on GaAs
- X-Ray Computerized Tomography Using Monochromated Synchrotron Radiation : Techniques, Instrumentations and Measurement
- Influence of Sensing Current on CPP-GMR Sensor with CoFe/Cu Multilayer
- Influence of Sensing Current on CPP-GMR Sensor with CoFe/Cu Multilayer(Recording systems & heads (I),The 8th Asian Symposium on Information Storage Technology (ASIST-8))
- Distortion of Electron-Beam-Recorded Patterns on a Photographic Plate due to Charge-Up
- Process and Device Technologies for High Speed Self-Aligned Bipolar Transistors
- In Situ X-Ray Monitoring of Metalorganic Vapor Phase Epitaxy
- Threading Dislocation Reduction in InP on GaAs by Thin Strained Interlayer and its Application to the Fabrication of 1.3-μm-Wavelength Laser on GaAs