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Central Research Lab. Hitachi Ltd. | 論文
- Influence of Underlayer Materials on Preferred Orientations of Sputter-Deposited AlN/Mo Bilayers for Film Bulk Acoustic Wave Resonators
- 1.5-GHz SAW Miniature Antenna Duplexer Used in Personal Digital Cellular (Special Issue on Microwave Devices for Mobile Communications)
- Improved Alignment Accuracy Using Lens-Distortion Correction for Electron-Beam Lithography in Mix-and-Match with an Optical Stepper
- Active Vibration Correction in Electron Beam Lithography System
- High Speed Electron Beam Cell Projection Exposure System (Special Issue on Quarter Micron Si Device and Process Technologies)
- EB call projection Lithography : Lithography Technology
- 1.45 μm Intersubband Absorption in InGaAs/AlAsSb Grown by Molecular Beam Epitaxy
- Improved Electron Mobility of AlInSb/InAsSb/AlInSb Heterostructures Grown Lattice-Mismatched on GaAs Substrates
- Experimental and Simulation Study of an Auxiliary Circuit to Improve Gain of the Quantum Flux Parametron
- InGaP/GaAs Sub-Square-Micron Emitter HBT with f_>100 GHz
- InGaP/GaAs Sub-Square-Micron Emitter HBT with f_>100GHz
- Highly Efficient Gettering of Heavy Metals Using Carbon Implanted Eptaxial Si Wafers
- Mask Fabrication with Submicron Line-Width by Electron Beam
- Fine Chromium Grating Directly Made by Irradiating Electron Beam
- Acid-Catalyzed Reactions of Tetrahydropyranyl-Protected Polyvinylphenol in a Novolak-Resin-Based Positive Resist
- Dissolution Inhibition of Phenolic Resist by Diazonaphthoquinone: Effect of Polymer Structure : Resist and Processes
- Dissolution Inhibition of Phenolic Resins by Diazonaphthoquinone : Effect of Polymer Structure
- Negative Resist for i-Line Lithography Utilizing Acid Catalyzed Silanol-Condensation Reaction : Resist Material and Process
- Applying a Mode Selector to Improve the Pulse-Compression Performance of Asymmetric-Coupled-Waveguide-Based Dispersion Compensators
- Electron Beam Mask Fabrication for MOSLSI's with 1.5 μm Design Rule : A-1: ADVANCED LITHOGRAPHY AND PROCESS