Miura Noriko | Renesas Electronics Corporation, Hitachinaka, Ibaraki 312-8504, Japan
スポンサーリンク
概要
- Miura Norikoの詳細を見る
- 同名の論文著者
- Renesas Electronics Corporation, Hitachinaka, Ibaraki 312-8504, Japanの論文著者
関連著者
-
Miura Noriko
Renesas Electronics Corporation, Hitachinaka, Ibaraki 312-8504, Japan
-
武田 健一
日立製作所 中央研究所
-
Takeda Ken-ichi
Central Research Laboratory Hitachi Ltd.
-
NOGUCHI Junji
Hitachi, Ltd., Micro Device Division
-
TAKEDA Ken-ichi
Hitachi, Ltd., Central Research Laboratory
-
TSUNEDA Ruriko
Hitachi, Ltd., Central Research Laboratory
-
MIURA Noriko
Renesas Technology Corp.
-
MAKABE Kazuya
Renesas Technology Corp.
-
Kubo Maki
Hitachi Ltd. Micro Device Division
-
Takeda Ken'ichi
Central Research Laboratory Hitachi Ltd.
-
Asai Koyu
Renesas Electronics Corporation, Hitachinaka, Ibaraki 312-8504, Japan
-
Asai Koyu
Renesas Electronics Corporation, 751 Horiguchi, Hitachinaka, Ibaraki 312-8504, Japan
-
Yamaguchi Tadashi
Renesas Technology Corp., 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan
-
Fujisawa Masahiko
Renesas Electronics Corporation, Hitachinaka, Ibaraki 312-8504, Japan
-
Maekawa Kazuyoshi
Renesas Electronics Corporation, Hitachinaka, Ibaraki 312-8504, Japan
-
Maekawa Kazuyoshi
Renesas Electronics Corporation, 751 Horiguchi, Hitachinaka, Ibaraki 312-8504, Japan
-
Eikyu Katsumi
Renesas Electronics Corporation, Hitachinaka, Ibaraki 312-8504, Japan
-
Yamashita Tomohiro
Renesas Electronics Corporation, Hitachinaka, Ibaraki 312-8504, Japan
-
Kawasaki Yoji
Renesas Electronics Corporation, Hitachinaka, Ibaraki 312-8504, Japan
-
Mizuo Mariko
Renesas Semiconductor Engineering Corporation, Itami, Hyogo 664-0005, Japan
-
Tsuchimoto Jun-ichi
Renesas Electronics Corporation, Hitachinaka, Ibaraki 312-8504, Japan
-
Takeda Ken-ichi
Central Research Laboratory, Hitachi Ltd., Kokubunji-shi, Tokyo 185-8601, Japan
-
Takeda Ken-ichi
Hitachi, Ltd., Central Research Laboratory, 1-280 Higashikoigakubo Kokubunji-shi, Tokyo 185-8601, Japan
-
Takeda Ken-ichi
Hitachi, Ltd., Central Research Laboratory, Kokubunji, Tokyo 185-8601, Japan
-
Takeda Ken-ichi
Central Research Laboratory, Hitachi Ltd., Higashikoigakubo, Kokubunji, Tokyo 185-8601, Japan
-
Miura Noriko
Renesas Technology Corp., 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan
-
Yamaguchi Tadashi
Renesas Electronics Corporation, Hitachinaka, Ibaraki 312-8504, Japan
-
Yamaguchi Tadashi
Renesas Electronics Corporation, 751 Horiguchi, Hitachinaka, Ibaraki 312-8504, Japan
-
Tsuneda Ruriko
Hitachi, Ltd., Central Research Laboratory, Kokubunji, Tokyo 185-8601, Japan
-
Makabe Kazuya
Renesas Technology Corp., 751 Horiguchi, Hitachinaka, Ibaraki 312-8504, Japan
著作論文
- Analytical Approach for Enhancement of n-Channel Metal--Oxide--Semiconductor Field-Effect Transistor Performance with Carbon-Doped Source/Drain Formed by Molecular Carbon Ion Implantation and Laser Annealing
- Influence of Cu-Ion Migration and Fine-Line Effect on Time-Dependent Dielectric Breakdown Lifetime of Cu Interconnects