TSUNEDA Ruriko | Hitachi, Ltd., Central Research Laboratory

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概要

• Tsuneda Rurikoの詳細を見る
• 同名の論文著者
• Hitachi, Ltd., Central Research Laboratoryの論文著者

関連著者

• NOGUCHI Junji

  Hitachi, Ltd., Micro Device Division

• TAKEDA Ken-ichi

  Hitachi, Ltd., Central Research Laboratory

• TSUNEDA Ruriko

  Hitachi, Ltd., Central Research Laboratory

• MAKABE Kazuya

  Renesas Technology Corp.

• 武田 健一

  日立製作所 中央研究所

• Takeda Ken-ichi

  Central Research Laboratory Hitachi Ltd.

• KUBO Maki

  Hitachi, Ltd., Micro Device Division

• Kubo Maki

  Device Development Center Hitachi Ltd.

• MIURA Noriko

  Renesas Technology Corp.

• Kubo Maki

  Hitachi Ltd. Micro Device Division

• Takeda Ken'ichi

  Central Research Laboratory Hitachi Ltd.

• Takeda Ken-ichi

  Central Research Laboratory, Hitachi Ltd., Kokubunji-shi, Tokyo 185-8601, Japan

• Takeda Ken-ichi

  Hitachi, Ltd., Central Research Laboratory, 1-280 Higashikoigakubo Kokubunji-shi, Tokyo 185-8601, Japan

• Takeda Ken-ichi

  Hitachi, Ltd., Central Research Laboratory, Kokubunji, Tokyo 185-8601, Japan

• Takeda Ken-ichi

  Central Research Laboratory, Hitachi Ltd., Higashikoigakubo, Kokubunji, Tokyo 185-8601, Japan

• Miura Noriko

  Renesas Technology Corp., 4-1 Mizuhara, Itami, Hyogo 664-0005, Japan

• Miura Noriko

  Renesas Electronics Corporation, Hitachinaka, Ibaraki 312-8504, Japan

• Tsuneda Ruriko

  Hitachi, Ltd., Central Research Laboratory, Kokubunji, Tokyo 185-8601, Japan

• Makabe Kazuya

  Renesas Technology Corp., 751 Horiguchi, Hitachinaka, Ibaraki 312-8504, Japan

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著作論文

• Influence of Cu-Ion Migration and Fine-Line Effect on Time-Dependent Dielectric Breakdown Lifetime of Cu Interconnects
• Influence of Cu-Ion Migration and Fine-Line Effect on Time-Dependent Dielectric Breakdown Lifetime of Cu Interconnects

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