Heylen Nancy | IMEC, Kapeldreef 75, B-3001 Leuven, Belgium

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著作論文

Advanced Organic Polymer for the Aggressive Scaling of Low-$k$ Materials
Dielectric Reliability of 50 nm Half Pitch Structures in Aurora\textregistered LK
W versus Co--Al as Gate Fill-Metal for Aggressively Scaled Replacement High-k/Metal Gate Devices for (Sub-)22 nm Technology Nodes
Effective Work Function Engineering for Aggressively Scaled Planar and Multi-Gate Fin Field-Effect Transistor-Based Devices with High-k Last Replacement Metal Gate Technology

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