Phatak Anup | Assignee at IMEC from Applied Materials Belgium NV, Kapeldreef 75, B-3001 Leuven, Belgium

スポンサーリンク

概要

関連著者

もっと見る

著作論文

W versus Co--Al as Gate Fill-Metal for Aggressively Scaled Replacement High-k/Metal Gate Devices for (Sub-)22 nm Technology Nodes
Effective Work Function Engineering for Aggressively Scaled Planar and Multi-Gate Fin Field-Effect Transistor-Based Devices with High-k Last Replacement Metal Gate Technology

スポンサーリンク