Komoda Hirotaka | Electronic Devices Company Ricoh Co. Ltd.
スポンサーリンク
概要
関連著者
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Komoda Hirotaka
Electronic Devices Company Ricoh Co. Ltd.
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Yasutake Kiyoshi
Department Of Material And Life Science Graduate School Of Engineering Osaka University
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Watanabe Heiji
Department Of Material And Life Science Graduate School Of Engineering Osaka University
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Watada Atsuyuki
Research & Development Group Ricoh Company Ltd.
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Yamamoto Yoh
Engineering Department R&d Department Sii Nano Technology Inc.
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KOMODA Hirotaka
Electronic Devices Company, Ricoh Co., Ltd.
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Iwasaki Kouji
Engineering Department R&d Department Sii Nano Technology Inc.
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Shimizu Katsusuke
Electronic Devices Division Ricoh Company Ltd.
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Yoshida Masaaki
Electronic Devices Company Ricoh Co. Ltd.
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Sasa Noboru
Research & Development Group, Ricoh Company, Ltd., 16-1 Shinei-cho, Tsuzuki-ku, Yokohama, Kanagawa 224-0035, Japan
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Hayashi Yoshitaka
Research & Development Group, Ricoh Company, Ltd., 16-1 Shinei-cho, Tsuzuki-ku, Yokohama, Kanagawa 224-0035, Japan
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Fujii Toshishige
Research & Development Group, Ricoh Company, Ltd., 16-1 Shinei-cho, Tsuzuki-ku, Yokohama, Kanagawa 224-0035, Japan
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Komoda Hirotaka
Electronic Devices Company, Ricoh Co., Ltd., 13-1 Himemuro-cho, Ikeda, Osaka 563-8501, Japan
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Yasutake Kiyoshi
Department Of Precision Science And Technology Graduate School Of Engineering Osaka University
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Watanabe Heiji
Department Of Precision Science And Technology Graduate School Of Engineering Osaka University
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Terauchi Masami
Institute Of Multidisciplinary Research For Advanced Materials Tohoku University
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Terauchi Masami
Institute For Multidisciplinary Research For Advanced Materials Tohoku University
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Watada Atsuyuki
Research And Development Center Ricoh Co. Ltd.
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Tsubokawa Yoshiyuki
Kobelco Research Institute
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Tsubokawa Yoshiyuki
Kobelco Research Institute Inc.
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ISHIDA Kazutaka
Electronic Devices Company, Ricoh Co., Ltd.
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SASAKAWA Kaoru
Kobelco Research Institute, Inc.
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OKANO Tomoki
Kobelco Research Institute, Inc.
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YOSHIDA Masaaki
Electronic Devices Company, Ricoh Co., Ltd.
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IWASAKI Kouji
Engineering Department R&D Department, SII Nano Technology Inc.
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Okano Tomoki
Kobelco Research Institute Inc.
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Sasakawa K
Kobelco Res. Inst. Inc.
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Komoda H
Ricoh Co. Ltd. Osaka Jpn
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Komoda Hirotaka
Electronic Devices Division Ricoh Company Ltd.
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Ishida Kazutaka
Electronic Devices Company Ricoh Co. Ltd.
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Sasakawa Kaoru
Kobelco Research Institute Inc.
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Otaka Kawori
Research & Development Group, Ricoh Company, Ltd., 16-1 Shinei-cho, Tsuzuki-ku, Yokohama, Kanagawa 224-0035, Japan
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Kamezaki Hisamitsu
Research & Development Group, Ricoh Company, Ltd., 16-1 Shinei-cho, Tsuzuki-ku, Yokohama, Kanagawa 224-0035, Japan
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Otaka Kawori
Research & Development Group, Ricoh Company, Ltd., 16-1 Shinei-cho, Tsuzuki-ku, Yokohama, Kanagawa 224-0035, Japan
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Fujii Toshishige
Research & Development Group, Ricoh Company, Ltd., 16-1 Shinei-cho, Tsuzuki-ku, Yokohama, Kanagawa 224-0035, Japan
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Nakatani Ikuko
Application Engineering Department, SII NanoTechnology Inc., 36-1 Takenoshita, Oyama-cho, Sunto-gun, Shizuoka 410-1393, Japan
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Yasutake Kiyoshi
Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan
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Kamezaki Hisamitsu
Research & Development Group, Ricoh Company, Ltd., 16-1 Shinei-cho, Tsuzuki-ku, Yokohama, Kanagawa 224-0035, Japan
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Iwasaki Kouji
Engineering Department R&D Department, SII Nano Technology Inc., 36-1 Takenoshita, Oyama-cho, Sunto-gun, Shizuoka 410-1393, Japan
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Yamamoto Yoh
Engineering Department R&D Department, SII Nano Technology Inc., 36-1 Takenoshita, Oyama-cho, Sunto-gun, Shizuoka 410-1393, Japan
著作論文
- Selective Excitation of a Symmetric Interference Plasmon Mode in Two Close Planar SiO_2/Si Interfaces Observed by Electron Energy-Loss Spectroscopy
- Charge Neutralization Using Focused 500eV Electron Beam in Focused Ion Beam System
- Antistatic Technique for Suppressing Charging in Focused Ion Beam Systems Using Microprobing and Ion-Beam-Assisted Deposition
- Charge Neutralization Using Focused 500 eV Electron Beam in Focused Ion Beam System
- Optical Beam Induced Current Techniques for Failure Analysis of Very Large Scale Integrated Circuits Devices
- Detection of Open Contact Using Optical-Beam-Induced Current Techniques
- Write-Once Disk with BiFeO Thin Films for Multilevel Optical Recording
- Write-Once Disc with BiFeO Thin Films for Multilevel Optical Recording