Yoshida Masaaki | Electronic Devices Company Ricoh Co. Ltd.
スポンサーリンク
概要
関連著者
-
Yoshida Masaaki
Electronic Devices Company Ricoh Co. Ltd.
-
Shoji Tadayoshi
Department Of Electronics Tohoku Institute Of Technology
-
Taguchi Tsunemasa
Department Of Electrical And Electronic Engineering Faculty Of Engineering Yamaguchi University
-
Onodera Chikara
Electronic Engineering Course, Aomori Prefectural Hachinohe Technical Senior High School, 1-2-27 Koyo, Hachinohe, Aomori 031-0801, Japan
-
Yasutake Kiyoshi
Department Of Material And Life Science Graduate School Of Engineering Osaka University
-
Yamamoto Yoh
Engineering Department R&d Department Sii Nano Technology Inc.
-
Watanabe Heiji
Department Of Material And Life Science Graduate School Of Engineering Osaka University
-
Iwasaki Kouji
Engineering Department R&d Department Sii Nano Technology Inc.
-
Komoda Hirotaka
Electronic Devices Company Ricoh Co. Ltd.
-
ONODERA Chikara
Electronic Engineering Course, Aomori Prefectural Towada Technical Senior High School
-
Yasutake Kiyoshi
Department Of Precision Science And Technology Graduate School Of Engineering Osaka University
-
Watanabe Heiji
Department Of Precision Science And Technology Graduate School Of Engineering Osaka University
-
KOMODA Hirotaka
Electronic Devices Company, Ricoh Co., Ltd.
-
YOSHIDA Masaaki
Electronic Devices Company, Ricoh Co., Ltd.
-
IWASAKI Kouji
Engineering Department R&D Department, SII Nano Technology Inc.
-
Komoda Hirotaka
Electronic Devices Company, Ricoh Co., Ltd., 13-1 Himemuro-cho, Ikeda, Osaka 563-8501, Japan
-
Yoshida Masaaki
Electronic Engineering Course, Aomori Prefectural Towada Technical Senior High School, 215-1 Shimotai Sanbongi, Towada, Aomori 034-0001, Japan
-
Onodera Chikara
Electronic Engineering Course, Aomori Prefectural Towada Technical Senior High School, 215-1 Shimotai Sanbongi, Towada, Aomori 034-0001, Japan
-
Shoji Tadayoshi
Department of Electronics, Tohoku Institute of Technology, Sendai 982-8577, Japan
-
Onodera Chikara
Electronic Engineering Course, Aomori Prefectural Towada Technical Senior High School, Towada, Aomori 034-0001, Japan
-
Iwasaki Kouji
Engineering Department R&D Department, SII Nano Technology Inc., 36-1 Takenoshita, Oyama-cho, Sunto-gun, Shizuoka 410-1393, Japan
-
Taguchi Tsunemasa
Department of Electrical and Electronic Engineering, Yamaguchi University, Ube, Yamaguchi 755-8611, Japan
-
Yamamoto Yoh
Engineering Department R&D Department, SII Nano Technology Inc., 36-1 Takenoshita, Oyama-cho, Sunto-gun, Shizuoka 410-1393, Japan
著作論文
- Charge Neutralization Using Focused 500eV Electron Beam in Focused Ion Beam System
- Effects of Dielectric Confinement on Exciton Binding Energies in ZnSe/MgxBeyZn1-x-ySe Quantum Wells
- Charge Neutralization Using Focused 500 eV Electron Beam in Focused Ion Beam System
- Effect of Image Charge on Exciton Binding Energy in ZnS/BexZn1-xS Quantum Wells
- Exciton Binding Energies in Cd0.11Zn0.89S/Mg0.22Zn0.78S Quantum Wells Lattice-Matched to GaP Substrates