Tsubokawa Yoshiyuki | Kobelco Research Institute Inc.
スポンサーリンク
概要
関連著者
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Tsubokawa Yoshiyuki
Kobelco Research Institute Inc.
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SHIMIZU Ryuichi
Department of Applied Physics, Osaka University
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HIROSAWA Satoshi
Sumitomo Special Metals Company Ltd.
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Hirosawa Satoshi
Sumitomo Special Metals Co. Ltd.
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Hirosawa Satoshi
Research And Development Division Neomax Company Limited
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Hirosawa S
Sumitomo Special Metals Co. Ltd.
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TSUBOKAWA Yoshiyuki
Department of Applied Physics, Faculty of Engineering, Osaka University
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Shimizu R
Osaka Univ. Osaka Jpn
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Shimizu Ryuichi
Department Of Applied Physics Faculty Of Engineering Osaka University
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Tsubokawa Y
Kobelco Res. Inst. Inc. Kobe Jpn
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Hirosawa Satoshi
Sumitomo Special Metals Co.
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Shimizu Ryuichi
Department Of Applied Physics Faculty Engineering Osaka University
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Terauchi Masami
Institute Of Multidisciplinary Research For Advanced Materials Tohoku University
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Terauchi Masami
Institute For Multidisciplinary Research For Advanced Materials Tohoku University
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Watada Atsuyuki
Research And Development Center Ricoh Co. Ltd.
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Shimizu R
Department Of Information Science Osaka Institute Of Technology
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Watada Atsuyuki
Research & Development Group Ricoh Company Ltd.
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Tsubokawa Yoshiyuki
Kobelco Research Institute
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KOMODA Hirotaka
Electronic Devices Company, Ricoh Co., Ltd.
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ISHIDA Kazutaka
Electronic Devices Company, Ricoh Co., Ltd.
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SASAKAWA Kaoru
Kobelco Research Institute, Inc.
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OKANO Tomoki
Kobelco Research Institute, Inc.
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Okano Tomoki
Kobelco Research Institute Inc.
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Sasakawa K
Kobelco Res. Inst. Inc.
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Komoda Hirotaka
Electronic Devices Company Ricoh Co. Ltd.
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Ishida Kazutaka
Electronic Devices Company Ricoh Co. Ltd.
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Sasakawa Kaoru
Kobelco Research Institute Inc.
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Shimizu Ryuichi
Department of Information Processing, Osaka Institute of Technology
著作論文
- Formation of "bcc Boundary Phase" in Transmission Electron Microscopy Samples of Nd-Fe-B Sintered Magnets
- Coercivity and Grain Boundary Morphology in Nd-Fe-B Sintered Magnets
- Selective Excitation of a Symmetric Interference Plasmon Mode in Two Close Planar SiO_2/Si Interfaces Observed by Electron Energy-Loss Spectroscopy