Nukaga Norimasa | Department Of Innovative And Engineered Materials Interdisciplinary Graduate School Of Science And E
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概要
- 同名の論文著者
- Department Of Innovative And Engineered Materials Interdisciplinary Graduate School Of Science And Eの論文著者
関連著者
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Funakubo Hiroshi
Department Of Innovative And Engineered Materials
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Nukaga Norimasa
Department Of Innovative And Engineered Materials Interdisciplinary Graduate School Of Science And E
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Funakubo Hiroshi
Department of Innovative and Engineered Material, Tokyo Institute of Technology, Yokohama 226-8503, Japan
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Fujisawa Hironori
Department Of Electrical Electronic And Computer Engineering Graduate School Of Engineering Hitneji
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Nukaga N
Department Of Innovative And Engineered Materials Interdisciplinary Graduate School Tokyo Institute
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NUKAGA Norimasa
Department of Innovative and Engineered Materials, Interdisciplinary Graduate School, Tokyo Institut
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FUNAKUBO Hiroshi
Department of Innovative and Engineered Materials, Interdisciplinary Graduate School, Tokyo Institut
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Nukaga Norimasa
Department of Innovative and Engineered Materials, Interdisciplinary Graduate School, Tokyo Institute of Technology
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Mitsuya Masatoshi
Department Of Innovative And Engineered Materials
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Mitsuya Masatoshi
Kanagawa Industrial Technology Research Institute
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Funakubo H
Dep. Of Innovative And Engineered Materials Tokyo Inst. Of Technol.
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Funakubo Hiroshi
Department Of Innovative And Engineered Materials Interdisciplinary Graduated School Of Science And
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舟窪 浩
東工大院総合理工学研究科
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Mitsuya Masatoshi
Kanagawa Industrial Technology Center
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MITSUYA MASATOSHI
Department of Radiology, Tohoku University School of Medicine
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石川 賢司
静大電子研
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Funakubo H
Tokyo Inst. Technol. Yokohama Jpn
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Ishikawa K
Department Of Organic And Polymeric Materials Tokyo Institute Of Technology
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石川 賢司
四日市大学総合政策学部
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ISHIKAWA Katsuyuki
Department of Innovative and Engineered Materials, Tokyo Institute of Technology
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Ishikawa Katsuyuki
Department Of Innovative And Engineered Materials Graduated School Of Science And Engineering Tokyo
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WATANABE Takayuki
Department of Innovative and Engineered Materials, Interdisciplinary Graduate School, Tokyo Institut
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Saito Keisuke
Application Laboratory Analytical Division Philips Japan Ltd.
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Saito K
Institute Of Industrial Science University Of Tokyo
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Watanabe Toshihide
Atr Adaptive Communications Research Laboratories:(present Address)nhk Science And Technical Researc
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Watanabe T
Department Of Innovative And Engineered Materials Interdisciplinary Graduate School Of Science And E
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Saito Kenichi
Institute Of Industrial Science University Of Tokyo
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Watanabe T
Laboratory Of Advanced Science And Technology For Industry University Of Hyogo
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Saito Kunio
Ntt Microsystem Integration Laboratories
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Watanabe Takeo
Univ. Hyogo Hyogo Jpn
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Saito K
Akita Univ. Akita Jpn
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Watanabe Takayuki
Department Of Innovative And Engineered Materials Tokyo Institute Of Technology
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Saito Keisuke
Application Laboratory Bruker Axs
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Watanabe Takayuki
Department Of Chemical Engineering Tokyo Institute Of Technology
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Watanabe Takayuki
Department Of Biochemistry School Of Dentistry Hokkaido University
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Watanabe Takayuki
Department of Innovative and Engineered Materials, Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology
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SAITO Keisuke
Application Laboratory
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Saito Kaichi
Kanagawa Industrial Technology Center
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SUZUKI Tatsuya
Research Laboratory for Nuclear Reactors, Tokyo Institute of Technology
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SUZUKI Muneyasu
Faculty of Science and Technology Tokyo University of Science
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NAGATA Hajime
Faculty of Science and Technology Tokyo University of Science
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TAKENAKA Tadashi
Faculty of Science and Technology Tokyo University of Science
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Fujimoto Masahiro
Faculty Of Engineering Hiroshima University
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Suzuki Takamasa
Department Of Electronics Nagoya University:r&d Department Nippondenso Co. Ltd.
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Osada M
National Inst. For Materials Sci. Tsukuba Jpn
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Suzuki T
Free Electron Laser Research Institute Inc.
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Abe Takumi
Department Of Advanced Materials Science Graduate School Of Frontier Sciences University Of Tokyo
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AKAI Tomonori
Department of Advanced Materials Science, Graduate School of Frontier Sciences, University of Tokyo
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石川 賢司
Shinshu Univ. Nagano Jpn
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Osada M
Advanced Materials Laboratory National Institute For Materials Science
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Suzuki T
Taiyo Yuden Co. Ltd. Gunma Jpn
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Suzuki T
Nhk (japan Broadcasting Corp.) Tokyo
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SUZUKI Toshimasa
Taiyo Yuden Co., Ltd.,
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FUJIMOTO Masayuki
Taiyo Yuden Co., Ltd.,
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SAITO Keisuke
Philips Japan, Ltd
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Suzuki Tatsuro
Department Of Electrical Engineering Shizuoka University
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NISHI Yuji
Taiyo Yuden Co., Ltd.
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Suzuki Tatsuhiko
Department Of Electrical Engineering Faculty Of Engineering Science University Of Tokyo
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Takenaka Tadashi
Faculty Of Science And Technology Science University Of Tokyo
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Fujimoto Masayuki
Taiyo Yuden Co. Lid.
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Suzuki Toshiharu
Sony Sc Ulsi R&d Laboratories
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Suzuki T
Process & Manufacturing Engineering Center Semiconductor Company Toshiba Corporation
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Fujimoto M
Taiyo Yuden Co. Ltd.
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Akai T
Philips Analytical Application Laboratory
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Nishi Yuji
Lnstitute Of Applied Biochemistry University Of Tsukuba
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Yamaji Isao
Philips Analyticai Appiication Laboratory Japan
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Akai Tomonori
Department Of Advanced Materials Science Graduate School Of Frontier Sciences University Of Tokyo
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Suzuki T
Department Of Applied Chemistry Faculty Of Technology Tokyo University Of Agriculture And Technology
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SAITO Mami
Process & Manufacturing Engineering Center, Semiconductor Company, Toshiba Corporation
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OKUWADA Kumi
Process & Manufacturing Engineering Center, Semiconductor Company, Toshiba Corporation
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OSADA Minoru
The Institute of Physical and Chemical Research (RIKEN)
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藤沢 浩訓
Dep. Of Innovative And Engineered Materials Tokyo Inst. Of Technol.
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AKAI Takao
Philips Analytical Application Laboratory
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MISTUYA Masatoshi
Department of Innovative and Engineered Materiais, Interdisciplinary Graduate School, Tokyo Institut
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Nishi Yuji
Taiyo Yuden Co. Ltd.
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Okuwada Kumi
Process & Manufacturing Engineering Center Semiconductor Company Toshiba Corporation
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Suzuki T
Taiyo Yuden Co. Ltd.
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Suzuki T
Tdk Corp. Chiba Jpn
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Nagata Hajime
Faculty Of Science And Technology Science University Of Tokyo
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Funakubo Hiroshi
Department Of Innovative And Engineered Materials Interdisciplinary Graduate School Of Science And E
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SUZUKI Toshimasa
Taiyo Yuden Co Ltd, R&D Center
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Saito Mami
Process & Manufacturing Engineering Center, Semiconductor Company, Toshiba Corporation
著作論文
- Direct Crystallization and Characterization of Bi_3TiTaO_9 Thin Films Prepared by Metalorganic Chemical Vapor Deposition
- Local Epitaxial Growth of (103) One-Axis-Oriented SrBi_2Ta_2O_9 Thin Films Prepared at Low Deposition Temperature by Metalorganic Chemical Vapor Deposition and Their Electrical Properties
- Preparation of SrBi_2Ta_2O_9 Thin Films Consisting of Uniform Grains at Low Temperature by Metalorganic Chemical Vapor Deposition : Electrical Properties of Condensed Matter
- Low Temperature Direct Crystallization of SrBi_2(Ta_Nb_x)_2O_9 Thin Films by Thermal Metalorganic Chemical Vapor Deposition and Their Properties
- Method of Distinguishing SrBi_2Ta_2O_9 Phase from Fluorite Phase Using X-Ray Diffraction Reciprocal Space Mapping
- Effect of Deposition Temperature and Composition on the Microstructure and Electrical Property of SrBi_2Ta_2O_9 Thin Films Prepared by Metalorganic Chemical Vapor Deposition
- Metalorganic Chemical Vapor Deposition of Epitaxial SrBi_2Ta_2O_9 Thin Films and Their Crystal Structure
- Preparation of SrBi_2Ta_2O_9 Thin Films by Metalorganic Chemical Vapor Deposition from Two New Liquid Organometallic Sources
- Property Improvement of 75nm-thick Directly crystallized SrBi_2Ta_2O_9 Thin Films by Pulse-introduced Metalorganic Chemical Vapor Deposition at Low Temperature : Electrical Properties of Condensed Matter
- Preparation and Characterization of SrBi_2(Ta_Nb_x)_2O_9 Thin Films by Metalorganic Chemical Vapor Deposition from Two Organometallic Source Bottles
- Low-Temperature Preparation of SrBi_2Ta_2O_9 Thin Films by Electron Cyclotron Resonance Plasma-Enhanced Metalorganic Chemical Vapor Deposition and Their Electrical Properties
- Direct Preparation of Crystalline SrBi_2(Ta_Nb_x)_2O_9 Thin Films by Thermal Metalorganic Chemical Vapor Deposition at Low Temperature