YAMAGAMI Shigeharu | Department of Electrical and Electronic Engineering, Tokyo Institute of Technology
スポンサーリンク
概要
関連著者
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YAMAGAMI Shigeharu
Department of Electrical and Electronic Engineering, Tokyo Institute of Technology
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YAMAGAMI Shigeharu
Silicon Systems Research Labs.
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Asada Masahiro
Department of Neurosurgery, Chibune Hospital
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Itoh Atsushi
Department of Arrhythmia and Electrophysiology, Shizuoka Saiseikai General Hospital
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Itoh Atsushi
Department Of Electrical And Electronic Engineering Tokyo Institute Of Technology
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Asada Masahiro
Department Of Electrical And Electronic Engineering Tokyo Institute Of Technology
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MIYAMOTO Yasuyuki
Department of Physical Electronics, Tokyo Institute of Technology
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FURUYA Kazuhito
Department of Physical Electronics, Tokyo Institute of Technology
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Saito W
Tokyo Inst. Technol. Tokyo Jpn
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Saito Wataru
Institute Of Agriculture And Forestry University Of Tsukuba
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SAITOH Wataru
Department of Electrical and Electronic Engineering, Tokyo Institute of Technology
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Itoh A
Ricoh Co. Ltd. Miyagi Jpn
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Arai T
Department Of Physical Electronics Tokyo Institute Of Technology
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Saitoh Wataru
Department Of Electrical And Electronic Engineering Tokyo Institute Of Technology
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Saito W
Toshiba Corp. Kawasaki Jpn
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Miyamoto Y
Department Of Physical Electronics Tokyo Institute Of Technology
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ARAI Toshiki
Department of Physical Electronics, Tokyo Institute of Technology
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Furuya Kazuhito
Department Of Electrical And Electronic Engineering
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Itoh A
Tokyo Inst. Technol. Tokyo Jpn
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Miyamoto Yasuyuki
Department Of Electrical And Electronic Engineering Tokyo Institute Of Technology
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Furuya K
Department Of Physical Electronics Tokyo Institute Of Technology
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Itoh Atsushi
Department Of Applied Chemistry Tokai University
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Miyamoto Yasuyuki
Department Of Electrical And Electronic Engineering
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HARADA Yoshimichi
the Department of Physical Electronics, Tokyo Institute of Technology
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HARADA Yoshimichi
Department of Electrical and Electronic Engineering, Tokyo Institute of Technology
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Harada Y
Univ. Hyogo Himeji‐shi Jpn
著作論文
- Analysis of Short-Channel Schottky Source/Drain Metal-Oxide-Semiconductor Field-Effect Transistor on Silicon-on-Insulator Substrate and Demonstration of Sub-50-nm n-type Devices with Metal Gate
- 35 nm Metal Gate p-type Metal Oxide Semiconductor Field-Effect Transistor with PtSi Schottky Source/Drain on Separation by Implanted Oxygen Substrate
- Reduction of Base-Collector Capacitance inSubmicron InP/GalnAs Heterojunction Bipolar Transistors with Buried Tungsten Wires : Semiconductors
- First Fabrication of GaInAs/InP Buried Metal Heterojunction Bipolar Transistor and Reduction of Base-Collector Capacitance