Lim Jae-won | Institute Of Multidisciplinary Research For Advanced Materials Tohoku University
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概要
関連著者
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Lim Jae-won
Institute Of Multidisciplinary Research For Advanced Materials Tohoku University
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ISSHIKI Minoru
Institute of Multidisciplinary Research for Advanced Materials, Tohoku University
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Isshiki Minoru
Instite For Advanced Materials Processing Tohoku University
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Lim Jae-won
Mineral Resources Research Division Korea Institute Of Geoscience & Mineral Resources
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Mimura Kouji
Institute Of Multidisciplinary Research For Advanced Materials Tohoku University
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Mimura Kouji
Institute For Advanced Materials Processing Tohoku University
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Mimura Kouji
Instite for Advanced Materials Processing Tohoku University
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一色 実
東北大多元研
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一色 実
東北大工
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三村 耕司
Institute Of Multidisciplinary Research For Advanced Materials Tohoku University
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Lim J‐w
Tohoku Univ. Sendai Jpn
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YAMASHITA Mutsuo
Seinan Industries Co. Ltd.
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一色 実
東北大選研
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Lim Jae-won
Mineral Resources Res. Div. Korea Inst. Of Geoscience And Mineral Resources
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Isshiki Minoru
Institute Of Multidisciplinary Research For Advanced Materials Tohoku University
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BAE Joon
Institute of Multidisciplinary Research for Advanced Materials, Tohoku University
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MIYAKE Kiyoshi
Graduate School of Science and Engineering, Saitama University
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Bae Joon
Institute Of Multidisciplinary Research For Advanced Materials Tohoku University
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Miyake Kiyoshi
Graduate School Of Science And Engineering Saitama University
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ISHIKAWA Yukio
Department of Radiology, Asahikawa Medical College
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三村 耕司
東北大学多元物質科学研究所
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Ishikawa Yukio
Department Of Pathology School Of Medicine Toho University
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Ishikawa Y
Department Of Substrate Engineering Semiconductor Division Sumitomo Electric Industries Ltd.
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Ishikawa Yukio
Department Of Forestry And Landscape Architecture Hokkaido College Senshu University
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Ishikawa Yukio
Department Of Clinical Laboratory Sado General Hospital
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ISHIKAWA Yukiko
Department of Medicine, Institute of Clinical Endocrinology, Tokyo Women's Medical University
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Isshiki Minoru
Inst. Of Multidisciplinary Res. For Advanced Materials Tohoku Univ.
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Bae Joon
Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, Sendai 980-8577, Japan
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Lim Jae-Won
Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, Sendai 980-8577, Japan
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ISHIKAWA Yukiko
Department of Medicine, Institute of Clinical Endocrinology, Tokyo Women's Medical University
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Isshiki Minoru
Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, Sendai 980-8577, Japan
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Miyake Kiyoshi
Graduate School of Science and Engineering, Saitama University, Saitama 338-8570, Japan
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Mimura Kouji
Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, Sendai 980-8577, Japan
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Ishikawa Yukio
Department of Applied Chemistry, Faculty of Engineering, Osaka University
著作論文
- Influence of Substrate Bias Voltage on the Impurity Concentrations in Hf Films Deposited by Ion Beam Deposition Method
- Interpretation of Dominant Impurities in Cu Films by Secondary Ion Mass Spectrometry and Glow Discharge Mass Spectrometry
- Trace Impurity Analysis in Ta Films Using Glow Discharge Mass Spectrometry : Concentration Change of Impurities by Applying Negative Substrate Bias Voltage
- Agglomeration of Copper Thin Film in Cu/Ta/Si Structure
- Effect of Substrate Bias Voltage on the Thermal Stability of Cu/Ta/Si Structures Deposited by Ion Beam Deposition
- Characteristics of ion beam deposited copper thin films as a seed layer : effect of negative substrate bias voltage
- Influence of Substrate Bias Voltage on the Properties of Cu Thin Films by Sputter Type Ion Beam Deposition
- Improvement of Ta Barrier Film Properties in Cu Interconnection by Using a Non-mass Separated Ion Beam Deposition Method
- Interpretation of Dominant Impurities in Cu Films by Secondary Ion Mass Spectrometry and Glow Discharge Mass Spectrometry
- Trace Impurity Analysis in Ta Films Using Glow Discharge Mass Spectrometry: Concentration Change of Impurities by Applying Negative Substrate Bias Voltage
- Effect of Substrate Bias Voltage on the Thermal Stability of Cu/Ta/Si Structures Deposited by Ion Beam Deposition