Characteristics of ion beam deposited copper thin films as a seed layer : effect of negative substrate bias voltage
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- Influence of Substrate Bias Voltage on the Impurity Concentrations in Hf Films Deposited by Ion Beam Deposition Method
- Interpretation of Dominant Impurities in Cu Films by Secondary Ion Mass Spectrometry and Glow Discharge Mass Spectrometry
- Trace Impurity Analysis in Ta Films Using Glow Discharge Mass Spectrometry : Concentration Change of Impurities by Applying Negative Substrate Bias Voltage
- Agglomeration of Copper Thin Film in Cu/Ta/Si Structure
- Effect of Substrate Bias Voltage on the Thermal Stability of Cu/Ta/Si Structures Deposited by Ion Beam Deposition
- Characteristics of ion beam deposited copper thin films as a seed layer : effect of negative substrate bias voltage
- Influence of Substrate Bias Voltage on the Properties of Cu Thin Films by Sputter Type Ion Beam Deposition
- Improvement of Ta Barrier Film Properties in Cu Interconnection by Using a Non-mass Separated Ion Beam Deposition Method
- Interpretation of Dominant Impurities in Cu Films by Secondary Ion Mass Spectrometry and Glow Discharge Mass Spectrometry
- Trace Impurity Analysis in Ta Films Using Glow Discharge Mass Spectrometry: Concentration Change of Impurities by Applying Negative Substrate Bias Voltage
- Effect of Substrate Bias Voltage on the Thermal Stability of Cu/Ta/Si Structures Deposited by Ion Beam Deposition