NAGASHIO Kosuke | Department of Materials Engineering, School of Engineering, The University of Tokyo
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概要
- NAGASHIO Kosukeの詳細を見る
- 同名の論文著者
- Department of Materials Engineering, School of Engineering, The University of Tokyoの論文著者
関連著者
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Toriumi Akira
Department Of Applied Physics University Of Tokyo
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NAGASHIO Kosuke
Department of Materials Engineering, School of Engineering, The University of Tokyo
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Nagashio Kosuke
Department Of Materials Engineering The University Of Tokyo
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KITA Koji
Department of Materials Science, Graduate School of Engineering, The University of Tokyo
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TORIUMI Akira
Department of Materials Science, Graduate School of Engineering, The University of Tokyo
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Kita Koji
Department Of Materials Engineering School Of Engineering The University Of Tokyo
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Toriumi Akira
Department Of Materials Engineering School Of Engineering The University Of Tokyo
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Toriumi Akira
Mirai-advanced Semiconductor Research Center (mirai-asrc) National Institute Of Advanced Industrial
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Toriumi A
Univ. Tokyo Tokyo Jpn
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Toriumi Akira
The Authors Are With Advanced Lsi Technology Laboratory Toshiba Corporation:presently With The Depar
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Toriumi Akira
Advanced Lsi Technology Toshiba Corporation
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Toriumi Akira
Advanced Lsi Technology Laboratory Research & Development Center Toshiba Co.
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Toriumi Akira
Department Of Materials Engineering The University Of Tokyo
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Toriumi Akira
Mirai-asrc Aist
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Kita Koji
Department of Material Engineering, The University of Tokyo, Bunkyo, Tokyo 113-8656, Japan
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NISHIMURA Tomonori
Department of Materials Engineering, School of Engineering, The University of Tokyo
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Kita Koji
Department Of Materials Engineering The University Of Tokyo
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Nishimura Tomonori
Department Of Chemistry Faculty Of Science Okayama University
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TABATA Toshiyuki
Department of Materials Engineering, School of Engineering, The University of Tokyo
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WANG Sheng
Department of Occupational Health, School of Public Health, Beijing University
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Park Chang
Department of Chemical and Biochemical Engineering, Dongguk University
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LEE Choong
Department of Anatomy and Cell Biology, College of Veterinary Medicine and BK21 Program for Veterina
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Lee Choong
Department Of Anatomy And Cell Biology College Of Veterinary Medicine And Bk21 Program For Veterinar
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Park Chang
Department Of Anatomic Pathology Chonnam National University Medical School
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SAKATA Shuichi
Department of Materials Engineering, School of Engineering, The University of Tokyo
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YOKOYAMA Takamichi
Department of Materials Engineering, School of Engineering, The University of Tokyo
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ZHU Li
Department of Immunology, Institute of Basic Medical Sciences, Chinese Academy of Medical Sciences a
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Park Chang
Department Of Materials Engineering School Of Engineering The University Of Tokyo
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Lee Choong
Department Of Materials Engineering School Of Engineering The University Of Tokyo
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Zhu Li
Department Of Agriscience And Bioscience Tokyo University Of Agriculture And Technology
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Sakata Shuichi
Institute Of Industrial Science And Institute For Nano Quantum Information Electronics University Of
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Sakata Shuichi
Department Of Materials Engineering School Of Engineering The University Of Tokyo
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Zhu Li
Department Of Materials Engineering The University Of Tokyo
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Wang Sheng
Department Of Materials Engineering The University Of Tokyo
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Takahashi Toshitake
Department Of Materials Engineering School Of Engineering The University Of Tokyo
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Yokoyama Takamichi
Department Of Materials Engineering School Of Engineering The University Of Tokyo
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Yokoyama Takamichi
Department Of Chemistry Nagaoka University Of Technology
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Wang Sheng
Department Of Applied Chemistry & Biotechnology Fukui University
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TORIUMI Akira
Department of Materials Engineering, School of Engineering, The University of Tokyo
著作論文
- Ge/GeO_2 Interface Control with High-Pressure Oxidation for Improving Electrical Characteristics
- Mobility Variations in Mono- and Multi-Layer Graphene Films
- Low Temperature Phosphorus Activation in Germanium through Nickel Germanidation for Shallow n^+/p Junction
- Grain Size Increase and Field-Effect Mobility Enhancement of Pentacene Thin Films Prepared in a Low-Pressure H_2 Ambient
- Observation of Dipole Layer Formed at High-k Dielectrics/SiO_2 Interface with X-ray Photoelectron Spectroscopy
- Effect of High-Pressure Inert Gas Annealing on AlON/Ge Gate Stacks