Harada Yoshimichi | Device Platforms Research Labs. Nec.

スポンサーリンク

概要

関連著者

もっと見る

著作論文

High Performance SiN-MIM Decoupling Capacitors with Surface-smoothed Bottom Electrodes for High-speed MPUs
Impact of Barrier Metal Sputtering on Low-k SiOCH Films with Various Chemical Structures
A Metallurgical Prescription Suppressing Stress-induced Voiding (SIV) in Cu lines
Mechanical Property Control of Low-k Dielectrics for Diminishing Chemical Mechanical Polishing (CMP)-Related Defects in Cu-Damascene Interconnects

スポンサーリンク