Heat-Resistant Co--W Catalytic Metals for Multilayer Graphene Chemical Vapor Deposition
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概要
- 論文の詳細を見る
Multilayer graphene (MLG) is expected to be a low-resistance and high-reliability interconnect material replacing copper (Cu) in nanoscale interconnects. Chemical vapor deposition (CVD) on catalytic metals is expected as a practical method for MLG deposition. To obtain high-quality MLG films without catalyst agglomeration by CVD, heat-resistant Co--W catalytic metals were investigated. The agglomeration of the Co--W catalytic metals was suppressed by increasing the W composition; however, MLG deposition was suppressed at the same time. The effects of W addition on the MLG growth were discussed from the viewpoints of the crystallographic change of the Co--W catalysts and chemical reactions. It was found that the Co grain size was reduced and the fcc Co formation was suppressed by W addition. In addition, graphite formation was supposed to be suppressed by W addition owing to the formation of phases other than fcc Co according to the Co--W--C phase diagram. With the optimum W concentration, MLG crystallinity was improved by high-temperature CVD using the heat-resistant Co--W catalytic metals (0.7 at. %) without agglomeration, compared with that in the case of using pure-Co catalysts.
- 2013-04-25
著者
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UENO Kazuyoshi
Shibaura Institute of Technology, Dept. of Electronic Engineering
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YAMAZAKI Yuichi
Low-Power Electronics Association and Project (LEAP)
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KAJITA Akihiro
Low-Power Electronics Association and Project (LEAP)
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Sakai Tadashi
Low-power Electronics Association & Project (LEAP), Kawasaki 212-8582, Japan
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Sakuma Naoshi
Low-power Electronics Association & Project (LEAP), Tsukuba, Ibaraki 305-8569, Japan
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Karasawa Yusuke
Shibaura Institute of Technology, Koto, Tokyo 135-8548, Japan
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Kuwahara Satoru
Shibaura Institute of Technology, Koto, Tokyo 135-8548, Japan
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Baba Shotaro
Shibaura Institute of Technology, Koto, Tokyo 135-8548, Japan
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Hanai Hitoshi
Shibaura Institute of Technology, Koto, Tokyo 135-8548, Japan
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