Enhancement of Diamond Nucleation by Atomic Silicon Microaddition (SELECTED TOPICS IN APPLIED PHYSICS : Diamond Semiconductors : from Materials to Devices)

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概要

• 論文の詳細を見る

著者

• Isshiki Hideo

  Department Of Electronics Faculty Of Electro-comunications The University Of Electro-communications

• Tamura Takashi

  Department Of Applied Chemistry Faculty Of Science Science University Of Tokyo

• Yoshida Mikio

  Department Of Applied Chemistry Faculty Of Engineering Okayama University

• Kinoshita Motoi

  Department Of Applied Chemistry Faculty Of Engineering Osaka University

• Tobita Ryutaro

  Department of Engineering Science, The University of Electro-Communications, Chofu, Tokyo 182-8585, Japan

• Shigeeda Tetsuya

  Department of Engineering Science, The University of Electro-Communications, Chofu, Tokyo 182-8585, Japan

• Matsushima Kenshiro

  Department of Engineering Science, The University of Electro-Communications, Chofu, Tokyo 182-8585, Japan

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