In Situ Study of Chemical Reaction between Silicon and Graphite at 1,400℃ in a High Resolution/Analytical Electron Microscope
スポンサーリンク
概要
著者
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Kamino Takeo
Naka Application Center Hitachi High-technologies Corporation
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SAKA Hiroyasu
Department of Quantum Engineering, Nagoya University
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YAGUCHI Toshie
Hitachi High Technologies Corp.
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KATO Takeharu
Japan Fine Ceramics Center
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Kamino T
Naka Application Center Hitachi High-technologies Corporation
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Saka H
Department Of Quantum Engineering Nagoya University
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