Novel Heterostructured Organic Photovoltaics Formed by Multilayered Direct Nanoimprinting

スポンサーリンク

概要

• 論文の詳細を見る

• Multilayered direct nanoimprint is proposed to expand the heterojunction area of an organic solar cell without demolding using a built-in electrode mold. The mold is directly imprinted onto a conventional multilayered planar [poly(3-hexylthiophene) (P3HT)/[6,6]-phenyl-C61-butyric acid methyl ester (PCBM)] heterostructure. The P3HT layer is lifted into the PCBM layer and the boundary of the junction area is successfully expanded, as investigated by simulation. The improvement in the short-circuit current of the photovoltaics as a result of adopting the nanoimprinted device is observed to be approximately 20% compared with planar heterostructured devices without nanopatterns formed under an equivalent sequence.

• 2013-06-25

著者

• Hirai Yoshihiko

  Physics And Electronics Engineering Osaka Prefecture University

• Kawata Hiroaki

  Physics and Electronics Engineering, Graduate School of Engineering, Osaka Prefecture University, Sakai 599-8531, Japan

• Tada Kazuhiro

  Department of Applied Chemistry, Faculty of Engineering, Osaka University

• Ishikawa Manabu

  Department of Electrical and Control Systems Engineering, Toyama National College of Technology, Toyama 939-8630, Japan

• Nishikura Naoki

  Physics and Electronics Engineering, Graduate School of Engineering, Osaka Prefecture University, Sakai 599-8531, Japan

• Tomohiro Kohei

  Physics and Electronics Engineering, Graduate School of Engineering, Osaka Prefecture University, Sakai 599-8531, Japan

• Fujita Honoka

  Physics and Electronics Engineering, Graduate School of Engineering, Osaka Prefecture University, Sakai 599-8531, Japan

関連論文

• Bias Effect on the Antiferroelectric Transition
• Ab Initio Study of Carbon Nanotubes in Electric Fields
• Effect of particle diameter on air polishing of dentin surfaces
• Fabrication of 3-dimensional structure by nanoimprint process
• Impact of Resist Shrinkage and Its Correction in Nanoimprint Lithography
• The characterization of dentin defects produced by air polishing
• Numerical and Experimental Analysis of Intermittent Line-and-Space Patterns in Thermal Nanoimprint
• Molecular Dynamics Study of Yield Stress of Si Mold for Nanoimprint Lithography
• Molecular Dynamics Study of Nanoimprint Lithography for Glass Materials
• Novel Heterostructured Organic Photovoltaics Formed by Multilayered Direct Nanoimprinting
• Evaluation of Demolding Energy for Various Demolding Modes in Embossing Process
• Mechanism of Charge-transfer Polymerization. III. Flash Photolysis of N-Vinylcarbazole–Chloranil System
• Mechanism of Charge-transfer Polymerization. X. Flash Photolysis of the N-Vinylcarbazole–Pyromellitic Dianhydride System
• Fabrication of Imprint Mold with Nanotrench Patterns by Edge Lithography

もっと見る 閉じる

スポンサーリンク