Rapid Growth of Diamond-like Carbon Films by Nanopulse Magnetron Chemical Vapor Deposition
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概要
- 論文の詳細を見る
In this paper, we describe the development of a rapid deposition method for diamond-like carbon (DLC) films. The deposition rate of DLC films is investigated using magnetic field enhanced nanopulse plasma chemical vapor deposition (CVD). The maximum deposition rate of DLC films produced by this magnetron CVD is approximately fifty times larger than that of the same films produced by conventional plasma CVD. The area of DLC films having a high deposition rate corresponds to the region of the magnetic field distribution where the field is parallel to the substrate at heights of 15–20 mm.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2007-05-15
著者
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Ohtake Naoto
Department Of Anatomy Shinshu University School Of Medicine
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Murakami Hiroya
Department Of Mechanical Science And Engineering Tokyo Institute Of Technology
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Kondo Yoshimasa
Ngk Insulators Ltd.
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Saito Takao
Ngk Insulators Ltd.
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Saito Masanori
Department Of Agricultural Chemistry The University Of Tokyo
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Murakami Hiroya
Department of Mechanical Science and Engineering, Tokyo Institute of Technology, Tokyo 152-8552, Japan
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Ohtake Naoto
Department of Materials, Nagoya University, Nagoya 464-8603, Japan
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Kondo Yoshimasa
NGK INSULATORS, Ltd., Nagoya 467-8530, Japan
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Saito Masanori
Department of Mechanical Science and Engineering, Tokyo Institute of Technology, Tokyo 152-8552, Japan
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