Effects of Oxygen Addition on Growth of Diamond Film by Arc Discharge Plasma Jet Chemical Vapor Deposition
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概要
- 論文の詳細を見る
Effects of oxygen addition on growth and crystallinity of diamond films are discussed. The etch rate of graphite by Ar-O_2 plasma jet is 130 times larger than that by Ar-H_2 plasma jet. Nucleation density of diamonds decreases with oxygen addition. The growth rate of diamond decreases with increase in the amount of added oxygen. Surface unevenness and porosity also decrease with increase in the amount of added oxygen, and it was found that the optimum oxygen concentration is about 33%. A diamond film of 1.2 mm thickness was fabricated under these conditions in 20 h. Surface unevenness of the diamond film was reduced to about 100 μm. The growth rates of the {111} planes and {100} planes become isotropic with 33% oxygen content. Therefore the diamond film surface is only slightly uneven and the film shows good crystallinity.
- 社団法人応用物理学会の論文
- 1993-05-15
著者
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OHNOKI Noriyuki
Precision and Intelligence Laboratory, Tokyo Institute of Technology
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Ohnoki Noriyuki
Precision And Intelligence Laboratory Tokyo Institute Of Technology
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Ohtake N
Niigata Univ. Niigata Jpn
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Ohtake Naoto
Department Of Anatomy Shinshu University School Of Medicine
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YOSHIKAWA Masanori
Department of Mechanical Engineering, Tokyo Institute of Technology
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Yoshikawa Masanori
Department Of Mechanical Engineering Tokyo Institute Of Technology
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