Magnetic Force Microscopy Study of Thermomagnetic Writing on Micron- and Submicron-Patterned TbFe Films Using Current Pulses
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概要
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Thermomagnetic writing was successfully performed on microfabricated TbFe films with a perpendicular anisotropy by applying current pulses. The magnetic domain was imaged after every pulse by magnetic force microscopy (MFM) to determine the minimum current required for writing on patterned films of different sizes. For a constant pulse width, the dependence of the required minimum current on the surface area ($A$) of square-patterned films was measured and showed an $A^{1/2}$ phenomenological variation. While it was also found that the current density and power density necessary for writing are invariable with the surface area of the patterned films for a given pulse width, and are about $5\times 10^{6}$ A/cm2 and 0.3 mW/μm2, respectively, using a pulse width of 100 ns in the presence of a “writing” field of 100 Oe.
- 2007-03-15
著者
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KATO Takeshi
Department of Applied Physics, University of Miyazaki
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YOU Long
Department of Electronics, Graduate School of Engineering, Nagoya University
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IWATA Satoshi
Center for Cooperative Research in Advanced Science and Technology (CCRAST), Nagoya University
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Tsunashima Shigeru
Department of Electronics, Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan
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Tsunashima Shigeru
Department of Electrical Engineering and Computer Science, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
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You Long
Department of Electronics, Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan
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Tsunashima Shigeru
Department of Applied Physics, Tokyo Institute of Technology
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Kato Takeshi
Department of Electronics, Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan
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